NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).

W. E. Baitinger, N. Winograd, J. W. Amy, J. A. Munarin

Research output: Contribution to conferencePaper

3 Scopus citations

Abstract

Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.

Original languageEnglish (US)
Pages1-6
Number of pages6
DOIs
StatePublished - Jan 1 1974
EventReliab Phys Symp, 12th Annu, Proc - Las Vegas, NV, USA
Duration: Apr 2 1974Apr 4 1974

Other

OtherReliab Phys Symp, 12th Annu, Proc
CityLas Vegas, NV, USA
Period4/2/744/4/74

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Fingerprint Dive into the research topics of 'NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).'. Together they form a unique fingerprint.

  • Cite this

    Baitinger, W. E., Winograd, N., Amy, J. W., & Munarin, J. A. (1974). NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).. 1-6. Paper presented at Reliab Phys Symp, 12th Annu, Proc, Las Vegas, NV, USA, . https://doi.org/10.1109/irps.1974.362619