NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).

W. E. Baitinger, Nicholas Winograd, J. W. Amy, J. A. Munarin

Research output: Contribution to conferencePaper

3 Citations (Scopus)

Abstract

Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.

Original languageEnglish (US)
Pages1-6
Number of pages6
StatePublished - Jan 1 1974
EventReliab Phys Symp, 12th Annu, Proc - Las Vegas, NV, USA
Duration: Apr 2 1974Apr 4 1974

Other

OtherReliab Phys Symp, 12th Annu, Proc
CityLas Vegas, NV, USA
Period4/2/744/4/74

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Resistors
X ray photoelectron spectroscopy
Metals
Photoelectron spectroscopy
Solid state reactions
Sputtering
Argon
X rays
Oxidation
Oxides
Ions
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Baitinger, W. E., Winograd, N., Amy, J. W., & Munarin, J. A. (1974). NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).. 1-6. Paper presented at Reliab Phys Symp, 12th Annu, Proc, Las Vegas, NV, USA, .
Baitinger, W. E. ; Winograd, Nicholas ; Amy, J. W. ; Munarin, J. A. / NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA). Paper presented at Reliab Phys Symp, 12th Annu, Proc, Las Vegas, NV, USA, .6 p.
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Baitinger, WE, Winograd, N, Amy, JW & Munarin, JA 1974, 'NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).' Paper presented at Reliab Phys Symp, 12th Annu, Proc, Las Vegas, NV, USA, 4/2/74 - 4/4/74, pp. 1-6.

NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA). / Baitinger, W. E.; Winograd, Nicholas; Amy, J. W.; Munarin, J. A.

1974. 1-6 Paper presented at Reliab Phys Symp, 12th Annu, Proc, Las Vegas, NV, USA, .

Research output: Contribution to conferencePaper

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T1 - NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).

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AU - Winograd, Nicholas

AU - Amy, J. W.

AU - Munarin, J. A.

PY - 1974/1/1

Y1 - 1974/1/1

N2 - Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.

AB - Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using x-ray photoelectron spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occurring between metals and metal oxides.

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Baitinger WE, Winograd N, Amy JW, Munarin JA. NICHROME RESISTOR FAILURES AS STUDIED BY X-RAY PHOTOELECTRON SPECTROSCOPY (XPS OR ESCA).. 1974. Paper presented at Reliab Phys Symp, 12th Annu, Proc, Las Vegas, NV, USA, .