NiTi thin films prepared by biased target ion beam deposition co-sputtering from elemental Ni and Ti targets

Huilong Hou, Reginald F. Hamilton, Mark W. Horn, Yao Jin

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

NiTi thin films are fabricated using biased target ion beam deposition technique. By design, the technique operates over a broad range of processing pressures; enables control of adatom energies; facilitates low energy bombardment; and promotes uniformity and repeatability. Thus, the technique is advantageous for preparing smooth and dense ultrathin films. Typically NiTi shape memory alloy thin films are deposited using the magnetron-sputtering technique and alloy targets. In this work films are co-sputtered from pure Ti and pure Ni targets and the technique is contrast with magnetron co-sputtering. Approximately 100 nm thick NiTi thin films are prepared with Ni-rich (> 50.5 at.% Ni), near equiatomic, and Ti-rich (< 49.5 at.% Ni) compositions. Atomic force microscopy reveals that films are consistently ultra-smooth over the broad range of compositions. The current findings confirm that biased target ion beam deposition can facilitate the preparation of high quality ultrathin NiTi films. After heat-treatment, the films deposited exhibit B2 and B19′ crystal structures and thus possess potential for martensitic phase transformation, which is the prerequisite for functional shape memory behavior.

Original languageEnglish (US)
Pages (from-to)1-6
Number of pages6
JournalThin Solid Films
Volume570
Issue numberPartA
DOIs
StatePublished - Nov 3 2014

Fingerprint

Ion beams
Sputtering
Ultrathin films
sputtering
ion beams
Shape memory effect
Thin films
thin films
Adatoms
Chemical analysis
Thick films
Magnetron sputtering
Atomic force microscopy
Crystal structure
Phase transitions
Heat treatment
shape memory alloys
adatoms
phase transformations
bombardment

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

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abstract = "NiTi thin films are fabricated using biased target ion beam deposition technique. By design, the technique operates over a broad range of processing pressures; enables control of adatom energies; facilitates low energy bombardment; and promotes uniformity and repeatability. Thus, the technique is advantageous for preparing smooth and dense ultrathin films. Typically NiTi shape memory alloy thin films are deposited using the magnetron-sputtering technique and alloy targets. In this work films are co-sputtered from pure Ti and pure Ni targets and the technique is contrast with magnetron co-sputtering. Approximately 100 nm thick NiTi thin films are prepared with Ni-rich (> 50.5 at.{\%} Ni), near equiatomic, and Ti-rich (< 49.5 at.{\%} Ni) compositions. Atomic force microscopy reveals that films are consistently ultra-smooth over the broad range of compositions. The current findings confirm that biased target ion beam deposition can facilitate the preparation of high quality ultrathin NiTi films. After heat-treatment, the films deposited exhibit B2 and B19′ crystal structures and thus possess potential for martensitic phase transformation, which is the prerequisite for functional shape memory behavior.",
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NiTi thin films prepared by biased target ion beam deposition co-sputtering from elemental Ni and Ti targets. / Hou, Huilong; Hamilton, Reginald F.; Horn, Mark W.; Jin, Yao.

In: Thin Solid Films, Vol. 570, No. PartA, 03.11.2014, p. 1-6.

Research output: Contribution to journalArticle

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