Nondestructive determination of boron doses in semiconductor materials using neutron depth profiling

Kenan Unlu, Mehmet Saglam, Bernard W. Wehring, Tim Z. Hossain, Elaine Custodio, John K. Lowell

Research output: Contribution to conferencePaper

1 Scopus citations

Abstract

The physical and electrical properties of semiconductor materials are greatly effected by implantation of boron and other elements. The dose and depth distribution of boron in the near surface region and across interfacial boundaries determine the quality of semiconductor devices. Therefore, a number of analytical techniques has been developed in the last two decades to measure boron doses and depth profiles in semiconductor materials. Neutron Depth Profiling (NDP) is one of the techniques which is capable of determining the boron dose as well as the concentration distribution in the near surface region of semiconductor materials. NDP is a nuclear technique which is based on the absorption reaction of thermal/cold neutrons by certain isotopes of low mass elements e.g., boron-10. In this study, boron doses in semiconductor materials were measured using NDP. The results will be used to complement the measurements done with other techniques and provide a basis for accurate dose calibration of commercial ion implant systems.

Original languageEnglish (US)
Pages575-578
Number of pages4
StatePublished - Dec 1 1996
EventProceedings of the 1996 11th International Conference on Ion Implantation Technology - Austin, TX, USA
Duration: Jun 16 1996Jun 21 1996

Other

OtherProceedings of the 1996 11th International Conference on Ion Implantation Technology
CityAustin, TX, USA
Period6/16/966/21/96

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Unlu, K., Saglam, M., Wehring, B. W., Hossain, T. Z., Custodio, E., & Lowell, J. K. (1996). Nondestructive determination of boron doses in semiconductor materials using neutron depth profiling. 575-578. Paper presented at Proceedings of the 1996 11th International Conference on Ion Implantation Technology, Austin, TX, USA, .