### Abstract

The present paper is concerned with the steady thin film flow of the Sisko fluid on a horizontal moving plate, where the surface tension gradient is a driving mechanism. The analytic solution for the resulting nonlinear ordinary differential equation is obtained by the Adomian decomposition method (ADM). The physical quantities are derived including the pressure profile, the velocity profile, the maximum residue time, the stationary points, the volume flow rate, the average film velocity, the uniform film thickness, the shear stress, the surface tension profile, and the vorticity vector. It is found that the velocity of the Sisko fluid film decreases when the fluid behavior index and the Sisko fluid parameter increase, whereas it increases with an increase in the inverse capillary number. An increase in the inverse capillary number results in an increase in the surface tension which in turn results in an increase in the surface tension gradient on the Sisko fluid film. The locations of the stationary points are shifted towards the moving plate with the increase in the inverse capillary number, and vice versa locations for the stationary points are found with the increasing Sisko fluid parameter. Furthermore, shear thinning and shear thickening characteristics of the Sisko fluid are discussed. A comparison is made between the Sisko fluid film and the Newtonian fluid film.

Original language | English (US) |
---|---|

Pages (from-to) | 847-862 |

Number of pages | 16 |

Journal | Applied Mathematics and Mechanics (English Edition) |

Volume | 36 |

Issue number | 7 |

DOIs | |

State | Published - Jul 3 2015 |

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### All Science Journal Classification (ASJC) codes

- Mechanics of Materials
- Mechanical Engineering
- Applied Mathematics

### Cite this

*Applied Mathematics and Mechanics (English Edition)*,

*36*(7), 847-862. https://doi.org/10.1007/s10483-015-1952-9

}

*Applied Mathematics and Mechanics (English Edition)*, vol. 36, no. 7, pp. 847-862. https://doi.org/10.1007/s10483-015-1952-9

**On study of horizontal thin film flow of Sisko fluid due to surface tension gradient.** / Siddiqui, Abdul M.; Ashraf, H.; Walait, A.; Haroon, T.

Research output: Contribution to journal › Article

TY - JOUR

T1 - On study of horizontal thin film flow of Sisko fluid due to surface tension gradient

AU - Siddiqui, Abdul M.

AU - Ashraf, H.

AU - Walait, A.

AU - Haroon, T.

PY - 2015/7/3

Y1 - 2015/7/3

N2 - The present paper is concerned with the steady thin film flow of the Sisko fluid on a horizontal moving plate, where the surface tension gradient is a driving mechanism. The analytic solution for the resulting nonlinear ordinary differential equation is obtained by the Adomian decomposition method (ADM). The physical quantities are derived including the pressure profile, the velocity profile, the maximum residue time, the stationary points, the volume flow rate, the average film velocity, the uniform film thickness, the shear stress, the surface tension profile, and the vorticity vector. It is found that the velocity of the Sisko fluid film decreases when the fluid behavior index and the Sisko fluid parameter increase, whereas it increases with an increase in the inverse capillary number. An increase in the inverse capillary number results in an increase in the surface tension which in turn results in an increase in the surface tension gradient on the Sisko fluid film. The locations of the stationary points are shifted towards the moving plate with the increase in the inverse capillary number, and vice versa locations for the stationary points are found with the increasing Sisko fluid parameter. Furthermore, shear thinning and shear thickening characteristics of the Sisko fluid are discussed. A comparison is made between the Sisko fluid film and the Newtonian fluid film.

AB - The present paper is concerned with the steady thin film flow of the Sisko fluid on a horizontal moving plate, where the surface tension gradient is a driving mechanism. The analytic solution for the resulting nonlinear ordinary differential equation is obtained by the Adomian decomposition method (ADM). The physical quantities are derived including the pressure profile, the velocity profile, the maximum residue time, the stationary points, the volume flow rate, the average film velocity, the uniform film thickness, the shear stress, the surface tension profile, and the vorticity vector. It is found that the velocity of the Sisko fluid film decreases when the fluid behavior index and the Sisko fluid parameter increase, whereas it increases with an increase in the inverse capillary number. An increase in the inverse capillary number results in an increase in the surface tension which in turn results in an increase in the surface tension gradient on the Sisko fluid film. The locations of the stationary points are shifted towards the moving plate with the increase in the inverse capillary number, and vice versa locations for the stationary points are found with the increasing Sisko fluid parameter. Furthermore, shear thinning and shear thickening characteristics of the Sisko fluid are discussed. A comparison is made between the Sisko fluid film and the Newtonian fluid film.

UR - http://www.scopus.com/inward/record.url?scp=84934440817&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84934440817&partnerID=8YFLogxK

U2 - 10.1007/s10483-015-1952-9

DO - 10.1007/s10483-015-1952-9

M3 - Article

AN - SCOPUS:84934440817

VL - 36

SP - 847

EP - 862

JO - Applied Mathematics and Mechanics

JF - Applied Mathematics and Mechanics

SN - 0253-4827

IS - 7

ER -