Optimal phase conflict removal for layout of dark field alternating phase shifting masks

Piotr Berman, Andrew B. Kahng, Devendra Vidhani, Huijuan Wang, Alex Zelikovskry

    Research output: Contribution to conferencePaperpeer-review

    14 Scopus citations

    Abstract

    We describe new, efficient algorithms for layout modification and phase assignment for dark field alternating-type phase-shifting masks in the single-exposure regime. We make the following contributions. First, the problem of minimizing the number of phase conflicts that must be removed to ensure 2-colorability of the conflict graph is transformed to the T-join problem. Second, we give new exact and approximate algorithms for the resulting T-join problem. The exact algorithm is linear in space and substantially faster for sparse graphs than previously known algorithms. The output of the approximate algorithm is much closer to the optimum than the algorithm suggested in [9]. These algorithms are applied within a `one-shot' phase assignment method suggested in [9] for co-optimization of layout and phase assignment for alternating phase-shifting masks. Preliminary computational experience is promising.

    Original languageEnglish (US)
    Pages121-126
    Number of pages6
    DOIs
    StatePublished - 1999
    EventProceedings of the 1999 International Symposium on Physical Design, ISPD-99 - Monterey, CA, USA
    Duration: Apr 12 1999Apr 14 1999

    Conference

    ConferenceProceedings of the 1999 International Symposium on Physical Design, ISPD-99
    CityMonterey, CA, USA
    Period4/12/994/14/99

    All Science Journal Classification (ASJC) codes

    • Electrical and Electronic Engineering

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