Optimization of a 193-nm silylation process for sub-0.25-um lithography

Susan C. Palmateer, Roderick R. Kunz, Mark W. Horn, A. R. Forte, Mordechai Rothschild

Research output: Chapter in Book/Report/Conference proceedingConference contribution

50 Scopus citations

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Mathematics

Physics & Astronomy

Chemical Compounds

Engineering & Materials Science