Optimization of thin film growth using multiscale process systems

Amit Varshney, Antonios Armaou

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

In this work we consider optimization problems for transport-reaction processes, when the cost function and/or equality constraints necessitate the consideration of phenomena that occur over widely disparate length scales. Initially, we develop multiscale process models that link continuum conservation laws with microscopic scale simulators. Subsequently, we combine nonlinear order reduction techniques for dissipative partial-differential equation systems with adaptive tabulation methods for microscopic simulators to reduce the computational requirements of the process description. The optimization problem is subsequently solved using standard search algorithms. The proposed method is applied to a representative thin film deposition process, where we compute optimal surface temperature profiles that simultaneously maximize deposition-rate uniformity (macroscale objective) and minimize surface roughness (microscale objective) across the film surface.

Original languageEnglish (US)
Article numberThB08.5
Pages (from-to)2559-2565
Number of pages7
JournalProceedings of the American Control Conference
Volume4
StatePublished - Sep 1 2005
Event2005 American Control Conference, ACC - Portland, OR, United States
Duration: Jun 8 2005Jun 10 2005

Fingerprint

Film growth
Simulators
Thin films
Deposition rates
Cost functions
Partial differential equations
Conservation
Surface roughness
Temperature

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Cite this

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Optimization of thin film growth using multiscale process systems. / Varshney, Amit; Armaou, Antonios.

In: Proceedings of the American Control Conference, Vol. 4, ThB08.5, 01.09.2005, p. 2559-2565.

Research output: Contribution to journalConference article

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