Origin of the flatband-voltage roll-off phenomenon in metal/high-k gate stacks

Gennadi Bersuker, Chang Seo Park, Huang Chun Wen, K. Choi, Jimmy Price, Patrick Lysaght, Hsing Huang Tseng, O. Sharia, Alex Demkov, Jason T. Ryan, P. Lenahan

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Engineering & Materials Science

Chemical Compounds