Oxidation and Reduction During Fabrication of High Quality Ndi. 85Ceo. L5Cu04-Y Superconducting Thin Films

S. N. Mao, X. X. Xi, S. Bhattacharya, Qi Li, J. L. Peng, J. Mao, D. H. Wu, S. M. Anlage, R. L. Greene, T. Venkatesan

Research output: Contribution to journalLetter

11 Citations (Scopus)

Abstract

Using pulsed-laser deposition and N2O reactive gas, we have successfully fabricated very high quality c-axis n-type Ndi.ssCeo.isCuO4-y (NCCO) oxide superconducting thin films epitaxially grown on different substrates. The film shows a superconducting transition temperature Tc (R = 0 O) of 22.4K and a transition width of 0.2K from ac susceptibility measurement The critical current density Jc is 8x105 A/cm2 at 4.2K in zero magnetic field. The microwave surface resistance measured at 9.6 GHz shows a value of 3 mü at 4.2K in 500 nm-thick NCCO film, the best result reported so far for NCCO thin films. The oxygen deficiency is necessary to achieve the superconductivity in NCCO and the oxygen reduction during and after film deposition is critical. The oxidation and reduction processes are studied systematically for various substrate temperature, atmosphere and annealing duration.

Original languageEnglish (US)
Pages (from-to)1552-1555
Number of pages4
JournalIEEE Transactions on Applied Superconductivity
Volume3
Issue number1
DOIs
StatePublished - Mar 1993

Fingerprint

Superconducting films
Oxygen
Fabrication
Surface resistance
Oxidation
oxidation
fabrication
hypoxia
Substrates
Pulsed laser deposition
thin films
Superconductivity
Thick films
Oxides
Superconducting transition temperature
pulsed laser deposition
thick films
critical current
superconductivity
Gases

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Mao, S. N. ; Xi, X. X. ; Bhattacharya, S. ; Li, Qi ; Peng, J. L. ; Mao, J. ; Wu, D. H. ; Anlage, S. M. ; Greene, R. L. ; Venkatesan, T. / Oxidation and Reduction During Fabrication of High Quality Ndi. 85Ceo. L5Cu04-Y Superconducting Thin Films. In: IEEE Transactions on Applied Superconductivity. 1993 ; Vol. 3, No. 1. pp. 1552-1555.
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abstract = "Using pulsed-laser deposition and N2O reactive gas, we have successfully fabricated very high quality c-axis n-type Ndi.ssCeo.isCuO4-y (NCCO) oxide superconducting thin films epitaxially grown on different substrates. The film shows a superconducting transition temperature Tc (R = 0 O) of 22.4K and a transition width of 0.2K from ac susceptibility measurement The critical current density Jc is 8x105 A/cm2 at 4.2K in zero magnetic field. The microwave surface resistance measured at 9.6 GHz shows a value of 3 m{\"u} at 4.2K in 500 nm-thick NCCO film, the best result reported so far for NCCO thin films. The oxygen deficiency is necessary to achieve the superconductivity in NCCO and the oxygen reduction during and after film deposition is critical. The oxidation and reduction processes are studied systematically for various substrate temperature, atmosphere and annealing duration.",
author = "Mao, {S. N.} and Xi, {X. X.} and S. Bhattacharya and Qi Li and Peng, {J. L.} and J. Mao and Wu, {D. H.} and Anlage, {S. M.} and Greene, {R. L.} and T. Venkatesan",
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Mao, SN, Xi, XX, Bhattacharya, S, Li, Q, Peng, JL, Mao, J, Wu, DH, Anlage, SM, Greene, RL & Venkatesan, T 1993, 'Oxidation and Reduction During Fabrication of High Quality Ndi. 85Ceo. L5Cu04-Y Superconducting Thin Films', IEEE Transactions on Applied Superconductivity, vol. 3, no. 1, pp. 1552-1555. https://doi.org/10.1109/77.233369

Oxidation and Reduction During Fabrication of High Quality Ndi. 85Ceo. L5Cu04-Y Superconducting Thin Films. / Mao, S. N.; Xi, X. X.; Bhattacharya, S.; Li, Qi; Peng, J. L.; Mao, J.; Wu, D. H.; Anlage, S. M.; Greene, R. L.; Venkatesan, T.

In: IEEE Transactions on Applied Superconductivity, Vol. 3, No. 1, 03.1993, p. 1552-1555.

Research output: Contribution to journalLetter

TY - JOUR

T1 - Oxidation and Reduction During Fabrication of High Quality Ndi. 85Ceo. L5Cu04-Y Superconducting Thin Films

AU - Mao, S. N.

AU - Xi, X. X.

AU - Bhattacharya, S.

AU - Li, Qi

AU - Peng, J. L.

AU - Mao, J.

AU - Wu, D. H.

AU - Anlage, S. M.

AU - Greene, R. L.

AU - Venkatesan, T.

PY - 1993/3

Y1 - 1993/3

N2 - Using pulsed-laser deposition and N2O reactive gas, we have successfully fabricated very high quality c-axis n-type Ndi.ssCeo.isCuO4-y (NCCO) oxide superconducting thin films epitaxially grown on different substrates. The film shows a superconducting transition temperature Tc (R = 0 O) of 22.4K and a transition width of 0.2K from ac susceptibility measurement The critical current density Jc is 8x105 A/cm2 at 4.2K in zero magnetic field. The microwave surface resistance measured at 9.6 GHz shows a value of 3 mü at 4.2K in 500 nm-thick NCCO film, the best result reported so far for NCCO thin films. The oxygen deficiency is necessary to achieve the superconductivity in NCCO and the oxygen reduction during and after film deposition is critical. The oxidation and reduction processes are studied systematically for various substrate temperature, atmosphere and annealing duration.

AB - Using pulsed-laser deposition and N2O reactive gas, we have successfully fabricated very high quality c-axis n-type Ndi.ssCeo.isCuO4-y (NCCO) oxide superconducting thin films epitaxially grown on different substrates. The film shows a superconducting transition temperature Tc (R = 0 O) of 22.4K and a transition width of 0.2K from ac susceptibility measurement The critical current density Jc is 8x105 A/cm2 at 4.2K in zero magnetic field. The microwave surface resistance measured at 9.6 GHz shows a value of 3 mü at 4.2K in 500 nm-thick NCCO film, the best result reported so far for NCCO thin films. The oxygen deficiency is necessary to achieve the superconductivity in NCCO and the oxygen reduction during and after film deposition is critical. The oxidation and reduction processes are studied systematically for various substrate temperature, atmosphere and annealing duration.

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JO - IEEE Transactions on Applied Superconductivity

JF - IEEE Transactions on Applied Superconductivity

SN - 1051-8223

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