Oxide degradation resulting from photoresist ashing

P. J. Mikulan, T. T. Koo, Osama O. Awadelkarim, S. J. Fonash

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

In this study, possible SiO2 damage that could result from several different photoresist ashing techniques has been assessed using patterned photoresist over blanket oxides. The types of ashing systems used were RF power (RF), upstream ozone generator (Upstram) and two microwave power reactors (Microwave 1 and Microwave 2). Aluminium capacitors were evaporated on the samples after the ashing for oxide evaluation. Electrical characterization of these MOS structures included capacitance versus voltage and time dependent dielectric breakdown measurements. We also looked for Si substrate damage in these samples using deep level transient spectroscopy and Schottky barrier current-voltage measurements.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
EditorsKenneth P. Rodbell, William F. Filter, Harold J. Frost, Paul S. Ho
PublisherPubl by Materials Research Society
Pages61-66
Number of pages6
Volume309
ISBN (Print)1558992057
StatePublished - Jan 1 1993
EventProceedings of the Symposium on Materials Reliability in Microelectronics III - San Francisco, CA, USA
Duration: Apr 12 1993Apr 15 1993

Other

OtherProceedings of the Symposium on Materials Reliability in Microelectronics III
CitySan Francisco, CA, USA
Period4/12/934/15/93

Fingerprint

Photoresists
Oxides
Microwaves
Degradation
Deep level transient spectroscopy
Ozone
Voltage measurement
Electric current measurement
Aluminum
Electric breakdown
Capacitors
Capacitance
Electric potential
Substrates

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

Cite this

Mikulan, P. J., Koo, T. T., Awadelkarim, O. O., & Fonash, S. J. (1993). Oxide degradation resulting from photoresist ashing. In K. P. Rodbell, W. F. Filter, H. J. Frost, & P. S. Ho (Eds.), Materials Research Society Symposium Proceedings (Vol. 309, pp. 61-66). Publ by Materials Research Society.
Mikulan, P. J. ; Koo, T. T. ; Awadelkarim, Osama O. ; Fonash, S. J. / Oxide degradation resulting from photoresist ashing. Materials Research Society Symposium Proceedings. editor / Kenneth P. Rodbell ; William F. Filter ; Harold J. Frost ; Paul S. Ho. Vol. 309 Publ by Materials Research Society, 1993. pp. 61-66
@inproceedings{0c3e0fb3d1cf406dad830823592192f5,
title = "Oxide degradation resulting from photoresist ashing",
abstract = "In this study, possible SiO2 damage that could result from several different photoresist ashing techniques has been assessed using patterned photoresist over blanket oxides. The types of ashing systems used were RF power (RF), upstream ozone generator (Upstram) and two microwave power reactors (Microwave 1 and Microwave 2). Aluminium capacitors were evaporated on the samples after the ashing for oxide evaluation. Electrical characterization of these MOS structures included capacitance versus voltage and time dependent dielectric breakdown measurements. We also looked for Si substrate damage in these samples using deep level transient spectroscopy and Schottky barrier current-voltage measurements.",
author = "Mikulan, {P. J.} and Koo, {T. T.} and Awadelkarim, {Osama O.} and Fonash, {S. J.}",
year = "1993",
month = "1",
day = "1",
language = "English (US)",
isbn = "1558992057",
volume = "309",
pages = "61--66",
editor = "Rodbell, {Kenneth P.} and Filter, {William F.} and Frost, {Harold J.} and Ho, {Paul S.}",
booktitle = "Materials Research Society Symposium Proceedings",
publisher = "Publ by Materials Research Society",

}

Mikulan, PJ, Koo, TT, Awadelkarim, OO & Fonash, SJ 1993, Oxide degradation resulting from photoresist ashing. in KP Rodbell, WF Filter, HJ Frost & PS Ho (eds), Materials Research Society Symposium Proceedings. vol. 309, Publ by Materials Research Society, pp. 61-66, Proceedings of the Symposium on Materials Reliability in Microelectronics III, San Francisco, CA, USA, 4/12/93.

Oxide degradation resulting from photoresist ashing. / Mikulan, P. J.; Koo, T. T.; Awadelkarim, Osama O.; Fonash, S. J.

Materials Research Society Symposium Proceedings. ed. / Kenneth P. Rodbell; William F. Filter; Harold J. Frost; Paul S. Ho. Vol. 309 Publ by Materials Research Society, 1993. p. 61-66.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Oxide degradation resulting from photoresist ashing

AU - Mikulan, P. J.

AU - Koo, T. T.

AU - Awadelkarim, Osama O.

AU - Fonash, S. J.

PY - 1993/1/1

Y1 - 1993/1/1

N2 - In this study, possible SiO2 damage that could result from several different photoresist ashing techniques has been assessed using patterned photoresist over blanket oxides. The types of ashing systems used were RF power (RF), upstream ozone generator (Upstram) and two microwave power reactors (Microwave 1 and Microwave 2). Aluminium capacitors were evaporated on the samples after the ashing for oxide evaluation. Electrical characterization of these MOS structures included capacitance versus voltage and time dependent dielectric breakdown measurements. We also looked for Si substrate damage in these samples using deep level transient spectroscopy and Schottky barrier current-voltage measurements.

AB - In this study, possible SiO2 damage that could result from several different photoresist ashing techniques has been assessed using patterned photoresist over blanket oxides. The types of ashing systems used were RF power (RF), upstream ozone generator (Upstram) and two microwave power reactors (Microwave 1 and Microwave 2). Aluminium capacitors were evaporated on the samples after the ashing for oxide evaluation. Electrical characterization of these MOS structures included capacitance versus voltage and time dependent dielectric breakdown measurements. We also looked for Si substrate damage in these samples using deep level transient spectroscopy and Schottky barrier current-voltage measurements.

UR - http://www.scopus.com/inward/record.url?scp=0027914992&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0027914992&partnerID=8YFLogxK

M3 - Conference contribution

SN - 1558992057

VL - 309

SP - 61

EP - 66

BT - Materials Research Society Symposium Proceedings

A2 - Rodbell, Kenneth P.

A2 - Filter, William F.

A2 - Frost, Harold J.

A2 - Ho, Paul S.

PB - Publ by Materials Research Society

ER -

Mikulan PJ, Koo TT, Awadelkarim OO, Fonash SJ. Oxide degradation resulting from photoresist ashing. In Rodbell KP, Filter WF, Frost HJ, Ho PS, editors, Materials Research Society Symposium Proceedings. Vol. 309. Publ by Materials Research Society. 1993. p. 61-66