Oxide degradation resulting from photoresist ashing

P. J. Mikulan, T. T. Koo, O. O. Awadelkarim, S. J. Fonash

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations
Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
PublisherPubl by Materials Research Society
Pages61-66
Number of pages6
ISBN (Print)1558992057, 9781558992054
DOIs
StatePublished - Jan 1 1993
EventProceedings of the Symposium on Materials Reliability in Microelectronics III - San Francisco, CA, USA
Duration: Apr 12 1993Apr 15 1993

Publication series

NameMaterials Research Society Symposium Proceedings
Volume309
ISSN (Print)0272-9172

Other

OtherProceedings of the Symposium on Materials Reliability in Microelectronics III
CitySan Francisco, CA, USA
Period4/12/934/15/93

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • Cite this

    Mikulan, P. J., Koo, T. T., Awadelkarim, O. O., & Fonash, S. J. (1993). Oxide degradation resulting from photoresist ashing. In Materials Research Society Symposium Proceedings (pp. 61-66). (Materials Research Society Symposium Proceedings; Vol. 309). Publ by Materials Research Society. https://doi.org/10.1557/proc-309-61