Oxide degradation resulting from photoresist ashing

P. J. Mikulan, T. T. Koo, Osama O. Awadelkarim, S. J. Fonash

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations


In this study, possible SiO2 damage that could result from several different photoresist ashing techniques has been assessed using patterned photoresist over blanket oxides. The types of ashing systems used were RF power (RF), upstream ozone generator (Upstram) and two microwave power reactors (Microwave 1 and Microwave 2). Aluminium capacitors were evaporated on the samples after the ashing for oxide evaluation. Electrical characterization of these MOS structures included capacitance versus voltage and time dependent dielectric breakdown measurements. We also looked for Si substrate damage in these samples using deep level transient spectroscopy and Schottky barrier current-voltage measurements.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
EditorsKenneth P. Rodbell, William F. Filter, Harold J. Frost, Paul S. Ho
PublisherPubl by Materials Research Society
Number of pages6
ISBN (Print)1558992057
Publication statusPublished - Jan 1 1993
EventProceedings of the Symposium on Materials Reliability in Microelectronics III - San Francisco, CA, USA
Duration: Apr 12 1993Apr 15 1993

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


OtherProceedings of the Symposium on Materials Reliability in Microelectronics III
CitySan Francisco, CA, USA


All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Mikulan, P. J., Koo, T. T., Awadelkarim, O. O., & Fonash, S. J. (1993). Oxide degradation resulting from photoresist ashing. In K. P. Rodbell, W. F. Filter, H. J. Frost, & P. S. Ho (Eds.), Materials Research Society Symposium Proceedings (pp. 61-66). (Materials Research Society Symposium Proceedings; Vol. 309). Publ by Materials Research Society.