Particle effect on the behavior and spreading kinetics of a nano-suspension drop: MD simulations

Baiou Shi, Weizhou Zhou, Edmund Webb

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Self-pinning is a phenomenon intrinsic to the advancement or retraction of liquid/solid/vapor three-phase contact lines for nano-fluid droplets. Another relevant phenomenon is de-pinning, where an initially halted contact line is able to separate from the pinning particle and continue its advance (or retraction) across the surface. Herein, results from molecular dynamics simulations are presented to explore the particle effects during both pinning and de-pinning events. Results presented illustrate how particle size and concentration affects spreading kinetics and how this connects to dynamic droplet morphology that exist nearby the contact line region.

Original languageEnglish (US)
Title of host publicationMS and T 2019 - Materials Science and Technology 2019
PublisherMaterials Science and Technology
Pages979-984
Number of pages6
ISBN (Electronic)0873397703, 9780873397704
DOIs
StatePublished - Jan 1 2019
EventMaterials Science and Technology 2019, MS and T 2019 - Portland, United States
Duration: Sep 29 2019Oct 3 2019

Publication series

NameMS and T 2019 - Materials Science and Technology 2019

Conference

ConferenceMaterials Science and Technology 2019, MS and T 2019
CountryUnited States
CityPortland
Period9/29/1910/3/19

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Fingerprint Dive into the research topics of 'Particle effect on the behavior and spreading kinetics of a nano-suspension drop: MD simulations'. Together they form a unique fingerprint.

  • Cite this

    Shi, B., Zhou, W., & Webb, E. (2019). Particle effect on the behavior and spreading kinetics of a nano-suspension drop: MD simulations. In MS and T 2019 - Materials Science and Technology 2019 (pp. 979-984). (MS and T 2019 - Materials Science and Technology 2019). Materials Science and Technology. https://doi.org/10.7449/2019/MST_2019_979_984