Phase-field model of domain structures in ferroelectric thin films

Y. L. Li, S. Y. Hu, Zi-kui Liu, Long-qing Chen

Research output: Contribution to journalArticle

241 Citations (Scopus)

Abstract

A phase-field model for predicting the coherent microstructure evolution in constrained thin films is developed. It employs an analytical elastic solution derived for a constrained film with arbitrary eigenstrain distributions. The domain structure evolution during a cubic→tetragonal proper ferroelectric phase transition is studied. It is shown that the model is able to simultaneously predict the effects of substrate constraint and temperature on the volume fractions of domain variants, domain-wall orientations, domain shapes, and their temporal evolution.

Original languageEnglish (US)
Pages (from-to)3878-3880
Number of pages3
JournalApplied Physics Letters
Volume78
Issue number24
DOIs
StatePublished - Jun 11 2001

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thin films
domain wall
microstructure
temperature

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

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Phase-field model of domain structures in ferroelectric thin films. / Li, Y. L.; Hu, S. Y.; Liu, Zi-kui; Chen, Long-qing.

In: Applied Physics Letters, Vol. 78, No. 24, 11.06.2001, p. 3878-3880.

Research output: Contribution to journalArticle

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