Photo-oxidation of σ-conjugated Si-Si network polymers

R. R. Kunz, M. W. Horn, P. A. Bianconi, A. Smith, C. A. Freed

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

The ultraviolet-induced photooxidation of polyalkylsilyne network polymers has been examined. Infrared and x-ray photoelectron spectroscopies indicate a higher oxygen coordination about the Si atoms following photolysis than observed for the linear polysilanes. A photochemical pathway leading to cleavage of the alkyl groups from the Si backbone has been observed, the products of which then desorb as the respective alkanes or 1-alkenes via a thermally activated process. Finally, the photooxidation rate at 193 nm of thin polyalkylsilyne films is photon limited at fluences less than 1–5 mj/cm2 per pulse; whereas above this fluenee, the photooxidation is oxygen limited. For the latter, the amount of oxygen chemically incorporated into the Si-Si network per laser pulse is dictated by the solubility level of oxidant in the film.

Original languageEnglish (US)
Pages (from-to)1447-1451
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume9
Issue number3
DOIs
StatePublished - May 1991

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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