TY - JOUR
T1 - Photochemical conversion of 2,5-diiodothiophene condensed on substrates to oligothiophene and polythiophene thin films and micro-patterns
AU - Natarajan, Sudarshan
AU - Kim, Seong H.
N1 - Funding Information:
This work is supported by Penn State MRSEC-MRI Seed Grant Program funded by the National Science Foundation (Grant No. DMR-0213623). The authors thank Penn State–Material Characterization Laboratory for the XPS analysis.
PY - 2006/2/21
Y1 - 2006/2/21
N2 - A simple and efficient photochemical process for in-situ fabrication of oligothiophene and polythiophene thin films and patterns is demonstrated. The process involves vapor deposition of monomeric precursor molecules, 2,5-diiodothiophene on a substrate followed by photodissociation of the C-I bond to produce monomer radicals that further react in the condensed phase to produce oligothiophene and polythiophene. The thienyl molecular structure of the precursor is preserved during the photochemical process, providing good π conjugation of the produced polymer. Alkyl and cross-linking defects are negligible in the produced film. The direct conversion of the adsorbed monomer to the conjugated polymer allows easy fabrication of thin films and micro-patterns of polythiophene.
AB - A simple and efficient photochemical process for in-situ fabrication of oligothiophene and polythiophene thin films and patterns is demonstrated. The process involves vapor deposition of monomeric precursor molecules, 2,5-diiodothiophene on a substrate followed by photodissociation of the C-I bond to produce monomer radicals that further react in the condensed phase to produce oligothiophene and polythiophene. The thienyl molecular structure of the precursor is preserved during the photochemical process, providing good π conjugation of the produced polymer. Alkyl and cross-linking defects are negligible in the produced film. The direct conversion of the adsorbed monomer to the conjugated polymer allows easy fabrication of thin films and micro-patterns of polythiophene.
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U2 - 10.1016/j.tsf.2005.09.098
DO - 10.1016/j.tsf.2005.09.098
M3 - Article
AN - SCOPUS:28044449961
VL - 496
SP - 606
EP - 611
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - 2
ER -