Photochemical properties of ultrathin TiO2 films prepared by chemical vapor deposition

Shinri Sato, A. Sobczynski, J. M. White, A. J. Bard, A. Campion, M. A. Fox, Thomas E. Mallouk, S. E. Webber

Research output: Contribution to journalArticle

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Abstract

Thin films of TiO2 were prepared on fused silica and titanium substrates by chemical vapor deposition (CVD) using Ti[OCH(CH3)2]4 under conditions of anatase formation. The UV-visible transmission spectrum of the film deposited on the fused silica substrate showed an absorption edge 30 nm shorter than that of anatase powder. This blue shift may be attributed to size quantization, i.e. the film may consist of extremely small TiO2 particles. The absorption edge shifted to slightly longer wavelength upon heating the film in air at high temperatures. The photocatalytic property of the film was examined using the photodeposition reaction of silver from aqueous AgNO3. The silver photodeposition rate increased with the calcination temperature, maximizing at around 400°C and then decreasing at higher temperature. To compare the photocatalytic property with the photoelectrochemical property, photocurrents were measured in a KOH solution using the film deposited on the titanium substrate. They decreased after calcination at temperatures above 400°C. Compared to bulk TiO2, the wavelength dependence of the current was shifted to considerably shorter wavelengths, in agreement with the absorption spectrum.

Original languageEnglish (US)
Pages (from-to)283-290
Number of pages8
JournalJournal of Photochemistry and Photobiology, A: Chemistry
Volume50
Issue number2
DOIs
StatePublished - Jan 1 1989

Fingerprint

Ultrathin films
Chemical vapor deposition
vapor deposition
Fused silica
Titanium
Silver
anatase
Wavelength
Calcination
roasting
Titanium dioxide
Substrates
titanium
silver
wavelengths
silicon dioxide
Temperature
Photocurrents
blue shift
Powders

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)
  • Physics and Astronomy(all)

Cite this

Sato, S., Sobczynski, A., White, J. M., Bard, A. J., Campion, A., Fox, M. A., ... Webber, S. E. (1989). Photochemical properties of ultrathin TiO2 films prepared by chemical vapor deposition. Journal of Photochemistry and Photobiology, A: Chemistry, 50(2), 283-290. https://doi.org/10.1016/1010-6030(89)85022-1
Sato, Shinri ; Sobczynski, A. ; White, J. M. ; Bard, A. J. ; Campion, A. ; Fox, M. A. ; Mallouk, Thomas E. ; Webber, S. E. / Photochemical properties of ultrathin TiO2 films prepared by chemical vapor deposition. In: Journal of Photochemistry and Photobiology, A: Chemistry. 1989 ; Vol. 50, No. 2. pp. 283-290.
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Sato, S, Sobczynski, A, White, JM, Bard, AJ, Campion, A, Fox, MA, Mallouk, TE & Webber, SE 1989, 'Photochemical properties of ultrathin TiO2 films prepared by chemical vapor deposition', Journal of Photochemistry and Photobiology, A: Chemistry, vol. 50, no. 2, pp. 283-290. https://doi.org/10.1016/1010-6030(89)85022-1

Photochemical properties of ultrathin TiO2 films prepared by chemical vapor deposition. / Sato, Shinri; Sobczynski, A.; White, J. M.; Bard, A. J.; Campion, A.; Fox, M. A.; Mallouk, Thomas E.; Webber, S. E.

In: Journal of Photochemistry and Photobiology, A: Chemistry, Vol. 50, No. 2, 01.01.1989, p. 283-290.

Research output: Contribution to journalArticle

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