Photoluminescence from SiO 2 nanostructures prepared by a sequential RIE process

Amirabbas Pirouz, Seyedehaida Ebrahimi, Farshid Karbassian, Shamsoddin Mohajerzadeh

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

SiO 2 nanostructures have been fabricated by sequential etching/passivation treatment of an amorphous SiO 2 layer, using mixture of SF 6, H 2 and O 2 gases. Photoluminescence measurements depicts that nano-textured SiO 2 films have emission spectra between 530 and 580 nm depending on the details of the sample treatment. The effects of sequence numbers, post-RIE-process hydrogenation treatment, and annealing temperature on the PL characteristics were explored. It is observed that annealing the porous SiO 2 nanostructures significantly increases the PL intensity. Increasing either the plasma current or hydrogenation time will cause a redshift in the PL spectrum. The morphology of the SiO 2 nanostructures has also been studied using field-emission scanning electron microscopy.

Original languageEnglish (US)
Title of host publication2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011
Pages372-375
Number of pages4
DOIs
StatePublished - Dec 1 2011
Event2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011 - Jeju, Korea, Republic of
Duration: Oct 18 2011Oct 21 2011

Other

Other2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011
CountryKorea, Republic of
CityJeju
Period10/18/1110/21/11

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Fingerprint Dive into the research topics of 'Photoluminescence from SiO <sub>2</sub> nanostructures prepared by a sequential RIE process'. Together they form a unique fingerprint.

  • Cite this

    Pirouz, A., Ebrahimi, S., Karbassian, F., & Mohajerzadeh, S. (2011). Photoluminescence from SiO 2 nanostructures prepared by a sequential RIE process. In 2011 IEEE Nanotechnology Materials and Devices Conference, NMDC 2011 (pp. 372-375). [6155380] https://doi.org/10.1109/NMDC.2011.6155380