TY - JOUR
T1 - Plasmonic Nanogaps
T2 - From Fabrications to Optical Applications
AU - Gu, Panpan
AU - Zhang, Wei
AU - Zhang, Gang
N1 - Funding Information:
This work was funded by the National Natural Science Foundation of China (Grant Nos. 51673085 and 51373066). The authors would like to thank Prof. Helmuth Möhwald for scientific discussions. When the authors prepared this article, Prof. Helmuth Möhwald left the authors forever. The authors have lost a great scientist and a wonderful person. The authors will remember Prof. Helmuth Möhwald as a generous and open-minded person, who always kept a clear view of the bigger picture. For the authors, Prof. Helmuth Möhwald was not only a friend, but also a family member. The sincere thoughts and prayers of the authors are with Prof. Helmuth Möhwald and Prof. Helmuth Möhwald’s family. This article is part of the Advanced Materials Interfaces Hall of Fame article series, which highlights the work of top interface and surface scientists.
Publisher Copyright:
© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2018/10/9
Y1 - 2018/10/9
N2 - Metallic nanostructures with nanogap features are proved to be highly effective building blocks for plasmonic systems, as they can provide ultrastrong electromagnetic (EM) fields and controllable optical properties. A wide range of fields, including surface enhanced spectroscopy, sensing, imaging, nonlinear optics, optical trapping, and metamaterials, are benefited from these enhanced EM fields. This review outlines the latest development of the fabrication methods for nanogap structures (metal nanoparticle assembly, nanosphere lithography, electron beam lithography (EBL), focused ion beam (FIB) lithography, oblique angle shadow evaporation, edge lithography, and so on), followed by a summary of their optical applications. The present review will inspire more ingenious designs and fabrications of plasmonic nanogap structures with lithography-free fabrication techniques, and promote their applications in optics and electronics.
AB - Metallic nanostructures with nanogap features are proved to be highly effective building blocks for plasmonic systems, as they can provide ultrastrong electromagnetic (EM) fields and controllable optical properties. A wide range of fields, including surface enhanced spectroscopy, sensing, imaging, nonlinear optics, optical trapping, and metamaterials, are benefited from these enhanced EM fields. This review outlines the latest development of the fabrication methods for nanogap structures (metal nanoparticle assembly, nanosphere lithography, electron beam lithography (EBL), focused ion beam (FIB) lithography, oblique angle shadow evaporation, edge lithography, and so on), followed by a summary of their optical applications. The present review will inspire more ingenious designs and fabrications of plasmonic nanogap structures with lithography-free fabrication techniques, and promote their applications in optics and electronics.
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U2 - 10.1002/admi.201800648
DO - 10.1002/admi.201800648
M3 - Review article
AN - SCOPUS:85052683390
SN - 2196-7350
VL - 5
JO - Advanced Materials Interfaces
JF - Advanced Materials Interfaces
IS - 19
M1 - 1800648
ER -