Plasmonic Nanogaps: From Fabrications to Optical Applications

Panpan Gu, Wei Zhang, Gang Zhang

Research output: Contribution to journalReview articlepeer-review

7 Scopus citations

Abstract

Metallic nanostructures with nanogap features are proved to be highly effective building blocks for plasmonic systems, as they can provide ultrastrong electromagnetic (EM) fields and controllable optical properties. A wide range of fields, including surface enhanced spectroscopy, sensing, imaging, nonlinear optics, optical trapping, and metamaterials, are benefited from these enhanced EM fields. This review outlines the latest development of the fabrication methods for nanogap structures (metal nanoparticle assembly, nanosphere lithography, electron beam lithography (EBL), focused ion beam (FIB) lithography, oblique angle shadow evaporation, edge lithography, and so on), followed by a summary of their optical applications. The present review will inspire more ingenious designs and fabrications of plasmonic nanogap structures with lithography-free fabrication techniques, and promote their applications in optics and electronics.

Original languageEnglish (US)
Article number1800648
JournalAdvanced Materials Interfaces
Volume5
Issue number19
DOIs
StatePublished - Oct 9 2018

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering

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