Processing-induced electron traps in n-type GaN

F. D. Auret, S. A. Goodman, G. Myburg, S. E. Mohney, J. M. De Lucca

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

We have used deep-level transient spectroscopy (DLTS) to investigate the electron trap defects introduced in n-GaN during the fabrication of Pt Schottky contacts by electro-deposition, electron beam deposition and sputter deposition under three different deposition conditions. The results indicate that electro-deposition is the only one of these processes that does not introduce any defects. Diodes fabricated by this technique also have the best rectification properties. Both electron beam deposition and sputter deposition introduce electron traps in concentrations that increase towards the Pt/GaN interface. However, sputter deposition at a lower power and higher pressure results in significantly reduced defect concentrations and improved rectification properties.

Original languageEnglish (US)
Pages (from-to)102-104
Number of pages3
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume82
Issue number1-3
DOIs
StatePublished - May 22 2001

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Processing-induced electron traps in n-type GaN'. Together they form a unique fingerprint.

Cite this