Production of microelectronic components by electrophoretic deposition

Jonathan J. Van Tassel, Clive A. Randall

Research output: Contribution to conferencePaper

Abstract

Electrophoretic deposition (EPD) is a particle based, electrodynamic forming process suitable for particles in the micron to nanometer size range. Beginning with a 300 nm diameter silver/palladium powder we have used EPD to produce 5 μm wide conductor lines with a 10 μm spacing on a dielectric tape. In this process a component is first imaged as a conductive pattern on a plastic film by conventional photolithography. This pattern is then immersed into a stable, dispersed and electrostatically charged suspension of particles. A voltage is applied between the conductive pattern and a counter electrode in the suspension, causing a current flow through the suspension, and attracting particles to the conductive pattern. The current creates an electro-chemical environment at the surface which causes the particles to deposit onto the pattern. This deposition can range from a monolayer to many thousands of particles thick. Using a binder, these deposited particles can then be transferred to another surface to be sintered or fused forming continuous lines or layers. The photolithographically produced conductor pattern can be re-used repeatedly to create more depositions. In this manner a single pattern produced by photolithography can be used to make multiple parts with photolithographic scale resolution.

Original languageEnglish (US)
Pages246-248
Number of pages3
StatePublished - Dec 1 2004
EventFinal Program and Proceedings of IS and T's NIP20: International Conference on Digital Printing Technologies - Salt Lake City, UT, United States
Duration: Oct 31 2004Nov 5 2004

Other

OtherFinal Program and Proceedings of IS and T's NIP20: International Conference on Digital Printing Technologies
CountryUnited States
CitySalt Lake City, UT
Period10/31/0411/5/04

Fingerprint

Microelectronics
Photolithography
Plastic films
Electrodynamics
Tapes
Palladium
Binders
Monolayers
Silver
Deposits
Powders
Electrodes
Electric potential

All Science Journal Classification (ASJC) codes

  • Media Technology
  • Computer Science Applications

Cite this

Van Tassel, J. J., & Randall, C. A. (2004). Production of microelectronic components by electrophoretic deposition. 246-248. Paper presented at Final Program and Proceedings of IS and T's NIP20: International Conference on Digital Printing Technologies, Salt Lake City, UT, United States.
Van Tassel, Jonathan J. ; Randall, Clive A. / Production of microelectronic components by electrophoretic deposition. Paper presented at Final Program and Proceedings of IS and T's NIP20: International Conference on Digital Printing Technologies, Salt Lake City, UT, United States.3 p.
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Van Tassel, JJ & Randall, CA 2004, 'Production of microelectronic components by electrophoretic deposition', Paper presented at Final Program and Proceedings of IS and T's NIP20: International Conference on Digital Printing Technologies, Salt Lake City, UT, United States, 10/31/04 - 11/5/04 pp. 246-248.

Production of microelectronic components by electrophoretic deposition. / Van Tassel, Jonathan J.; Randall, Clive A.

2004. 246-248 Paper presented at Final Program and Proceedings of IS and T's NIP20: International Conference on Digital Printing Technologies, Salt Lake City, UT, United States.

Research output: Contribution to conferencePaper

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Van Tassel JJ, Randall CA. Production of microelectronic components by electrophoretic deposition. 2004. Paper presented at Final Program and Proceedings of IS and T's NIP20: International Conference on Digital Printing Technologies, Salt Lake City, UT, United States.