Abstract
A MgB 2 thin film deposition technology is the first critical step in the development of superconducting electronics utilizing the 39 K superconductor. It turned out to be a challenging task due to the volatility of Mg and phase stability of MgB 2, the low sticking coefficients of Mg at elevated temperatures, and the reactivity of Mg with oxygen. A brief overview of current deposition techniques is provided here from a thermodynamic perspective, with an emphasis on a very successful technique for high quality in situ epitaxial MgB 2 films, the hybrid physical-chemical vapor deposition. Examples of heterostructures of MgB 2 with other materials are also presented.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 37-44 |
| Number of pages | 8 |
| Journal | Institute of Physics Conference Series |
| Volume | 181 |
| State | Published - Dec 1 2004 |
| Event | Applied Superconductivity 2003 - Proceedings of the Sixth European Conference on Applied Superconductivity - Sorrento, Italy Duration: Sep 14 2003 → Sep 18 2003 |
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All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)
Cite this
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Progress in the deposition of MgB 2 thin films. / Xi, X. X.; Pogrebnyakov, A. V.; Zeng, X. H.; Redwing, Joan Marie; Xu, S. Y.; Li, Qi; Liu, Zi-kui; Lettieri, J.; Vaithyanathan, V.; Schlom, D. G.; Christen, H. M.; Zhai, H. Y.; Goyal, A.
In: Institute of Physics Conference Series, Vol. 181, 01.12.2004, p. 37-44.Research output: Contribution to journal › Conference article
TY - JOUR
T1 - Progress in the deposition of MgB 2 thin films
AU - Xi, X. X.
AU - Pogrebnyakov, A. V.
AU - Zeng, X. H.
AU - Redwing, Joan Marie
AU - Xu, S. Y.
AU - Li, Qi
AU - Liu, Zi-kui
AU - Lettieri, J.
AU - Vaithyanathan, V.
AU - Schlom, D. G.
AU - Christen, H. M.
AU - Zhai, H. Y.
AU - Goyal, A.
PY - 2004/12/1
Y1 - 2004/12/1
N2 - A MgB 2 thin film deposition technology is the first critical step in the development of superconducting electronics utilizing the 39 K superconductor. It turned out to be a challenging task due to the volatility of Mg and phase stability of MgB 2, the low sticking coefficients of Mg at elevated temperatures, and the reactivity of Mg with oxygen. A brief overview of current deposition techniques is provided here from a thermodynamic perspective, with an emphasis on a very successful technique for high quality in situ epitaxial MgB 2 films, the hybrid physical-chemical vapor deposition. Examples of heterostructures of MgB 2 with other materials are also presented.
AB - A MgB 2 thin film deposition technology is the first critical step in the development of superconducting electronics utilizing the 39 K superconductor. It turned out to be a challenging task due to the volatility of Mg and phase stability of MgB 2, the low sticking coefficients of Mg at elevated temperatures, and the reactivity of Mg with oxygen. A brief overview of current deposition techniques is provided here from a thermodynamic perspective, with an emphasis on a very successful technique for high quality in situ epitaxial MgB 2 films, the hybrid physical-chemical vapor deposition. Examples of heterostructures of MgB 2 with other materials are also presented.
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UR - http://www.scopus.com/inward/citedby.url?scp=13644264959&partnerID=8YFLogxK
M3 - Conference article
AN - SCOPUS:13644264959
VL - 181
SP - 37
EP - 44
JO - Institute of Physics Conference Series
JF - Institute of Physics Conference Series
SN - 0951-3248
ER -