Progress in the deposition of MgB 2 thin films

X. X. Xi, A. V. Pogrebnyakov, X. H. Zeng, Joan Marie Redwing, S. Y. Xu, Qi Li, Zi-kui Liu, J. Lettieri, V. Vaithyanathan, D. G. Schlom, H. M. Christen, H. Y. Zhai, A. Goyal

Research output: Contribution to journalConference article

Abstract

A MgB 2 thin film deposition technology is the first critical step in the development of superconducting electronics utilizing the 39 K superconductor. It turned out to be a challenging task due to the volatility of Mg and phase stability of MgB 2, the low sticking coefficients of Mg at elevated temperatures, and the reactivity of Mg with oxygen. A brief overview of current deposition techniques is provided here from a thermodynamic perspective, with an emphasis on a very successful technique for high quality in situ epitaxial MgB 2 films, the hybrid physical-chemical vapor deposition. Examples of heterostructures of MgB 2 with other materials are also presented.

Original languageEnglish (US)
Pages (from-to)37-44
Number of pages8
JournalInstitute of Physics Conference Series
Volume181
Publication statusPublished - Dec 1 2004
EventApplied Superconductivity 2003 - Proceedings of the Sixth European Conference on Applied Superconductivity - Sorrento, Italy
Duration: Sep 14 2003Sep 18 2003

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Xi, X. X. ; Pogrebnyakov, A. V. ; Zeng, X. H. ; Redwing, Joan Marie ; Xu, S. Y. ; Li, Qi ; Liu, Zi-kui ; Lettieri, J. ; Vaithyanathan, V. ; Schlom, D. G. ; Christen, H. M. ; Zhai, H. Y. ; Goyal, A. / Progress in the deposition of MgB 2 thin films. In: Institute of Physics Conference Series. 2004 ; Vol. 181. pp. 37-44.