Properties of MgB2 films grown at various temperatures by hybrid physical-chemical vapour deposition

Ke Chen, Menno Veldhorst, Che Hui Lee, Daniel R. Lamborn, Raymond Defrain, Joan M. Redwing, Qi Li, X. X. Xi

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

A hybrid physical-chemical vapour deposition (HPCVD) system consisting of separately controlled Mg-source heater and substrate heater is used to grow MgB2 thin films and thick films at various temperatures. We are able to grow superconducting MgB2 thin films at temperatures as low as 350 °C with a Tc0 of 35.5K. MgB2 films up to 4νm in thickness grown at 550 °C have Jc over 106Acm -2 at 5K and zero applied field. The low deposition temperature of MgB2 films is desirable for all-MgB2 tunnel junctions and MgB2 thick films are important for applications in coated conductors.

Original languageEnglish (US)
Article number095015
JournalSuperconductor Science and Technology
Volume21
Issue number9
DOIs
StatePublished - Sep 1 2008

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Condensed Matter Physics
  • Metals and Alloys
  • Electrical and Electronic Engineering
  • Materials Chemistry

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