Quantitative in-situ TEM study of stress-assisted grain growth

Sandeep Kumar, Tarek Alam, Aman Haque

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

We present a quantitative in-situ transmission electron microscope (TEM) study of stress-assisted grain growth in 75 nm thick platinum thin films. We utilized notch-induced stress concentration to observe the microstructural evolution in real time. From quantitative measurements, we find that rapid grain growth occurred above 290 MPa of far field stress and ~0.14% elongation. This value is found to be higher than that required for stable interface motion but lower than the stress required for unstable grain boundary motion. We attribute such grain growth to geometrical incompatibility arising out of crystallographic misorientation in adjoining grains, or in other words, geometrically necessary grain growth.

Original languageEnglish (US)
Pages (from-to)101-105
Number of pages5
JournalMRS Communications
Volume3
Issue number2
DOIs
StatePublished - 2013

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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