Radiation-induced synergistic effects of athermal and thermal mechanisms on erosion and surface evolution of advanced electrode and condenser optics materials

Jean P. Allain, Ahmed Hassanein, Tatiana Burtseva, Abdelatif Yacout, Zinetulla Insepov, Sarfraz Taj, Bryan J. Rice

Research output: Contribution to journalConference article

11 Scopus citations

Abstract

In extreme ultraviolet lithography (EUVL) environments transient plasma dynamics dictate conditions for particle/surface interactions. A critical challenge facing EUVL development is optic component lifetime both in gasdischarge produced plasmas (GDPP) and laser-produced plasmas (LPP) devices. Optic components are exposed to impingent species, impurities (H,C,O,N) and debris leading to their degradation and consequently limiting 13.5 nm light reflection intensity. Experiments in the PRIME (Particles and Radiation Interaction with Matter Experiments) facility at the Argonne National Laboratory study the synergy between radiation-induced athermal and thermal mechanisms that influence the behavior of EUVL materials (electrodes and condenser optics) under irradiation conditions including: incident particle energy (50 eV - 5 keV), angle-of-incidence (near-normal to oblique), incident flux (10 11-1017 ions/cm2/s), surface coatings (impurity: C,O or capping layers: Ru, W), and surface temperature (100-1000°C). Results of electrode and optical component interaction with singly-charged inert gases (Xe) are presented. Critical issues under study include: radiation enhanced diffusion, radiation induced segregation, preferential sputtering, collisional mixing, surface segregation, surface amorphization, thermal diffusion and thermal spike evolution. Experiments in PRIME will be complemented with atomistic modeling to study how these mechanisms modify surfaces and how these mechanisms can work synergistically to introduce solutions to enhance component lifetime of electrode and condenser optic materials.

Original languageEnglish (US)
Pages (from-to)112-121
Number of pages10
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5374
Issue numberPART 1
DOIs
StatePublished - Aug 18 2004
EventEmerging Lithographic Technologies VIII - Santa Clara, CA, United States
Duration: Feb 24 2004Feb 26 2004

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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