Range profiles and thermal release of 3He implanted into various nickel-based amorphous alloys

Kenan Ünlü, Dietrich H. Vincent

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The behavior of 3He in the amorphous alloys Ni75.1Cr14P10.1C0.08, Ni63.5Zr36.5 and Ni87.7P12.3 is investigated. The samples were implanted with 150 keV 3He ions with doses of 1 × 1016 and 5 × 1016 3He/cm2. The samples were isochronally annealed at several consecutive stages up to their crystallization temperatures. After each annealing stage, 3He depth profiles were measured by a thermal-neutron-induced nuclear-reaction technique called neutron depth profiling (NDP). The maximum 3He release (∼20%) was observed for the Ni63.5Zr36.5 sample and it occurred before crystallization. Smaller but measurable amounts of 3He were released from most other combinations of sample material and implant doses. The 3He release that we observed is controlled by a detrapping process, and there are indications that it is dependent on the implantation dose. In addition to 3He release measurements, our study yielded a determination of projected depths of 3He ions with an initial energy of 150 keV in the alloys studied. The most probable range values are: 320 ± 21 nm for Ni75.1Cr14P10.1C0.08, 378 ± 34 nm for Ni63.5Zr36.5 and 375 ± 29 nm for Ni87.7P12.3.

Original languageEnglish (US)
Pages (from-to)606-609
Number of pages4
JournalNuclear Inst. and Methods in Physics Research, A
Volume299
Issue number1-3
DOIs
StatePublished - Dec 20 1990

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Amorphous alloys
Neutrons
Crystallization
Nickel
nickel
Nuclear reactions
Depth profiling
Ions
profiles
dosage
Annealing
crystallization
thermal neutrons
nuclear reactions
implantation
ions
indication
neutrons
Temperature
annealing

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Instrumentation

Cite this

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title = "Range profiles and thermal release of 3He implanted into various nickel-based amorphous alloys",
abstract = "The behavior of 3He in the amorphous alloys Ni75.1Cr14P10.1C0.08, Ni63.5Zr36.5 and Ni87.7P12.3 is investigated. The samples were implanted with 150 keV 3He ions with doses of 1 × 1016 and 5 × 1016 3He/cm2. The samples were isochronally annealed at several consecutive stages up to their crystallization temperatures. After each annealing stage, 3He depth profiles were measured by a thermal-neutron-induced nuclear-reaction technique called neutron depth profiling (NDP). The maximum 3He release (∼20{\%}) was observed for the Ni63.5Zr36.5 sample and it occurred before crystallization. Smaller but measurable amounts of 3He were released from most other combinations of sample material and implant doses. The 3He release that we observed is controlled by a detrapping process, and there are indications that it is dependent on the implantation dose. In addition to 3He release measurements, our study yielded a determination of projected depths of 3He ions with an initial energy of 150 keV in the alloys studied. The most probable range values are: 320 ± 21 nm for Ni75.1Cr14P10.1C0.08, 378 ± 34 nm for Ni63.5Zr36.5 and 375 ± 29 nm for Ni87.7P12.3.",
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Range profiles and thermal release of 3He implanted into various nickel-based amorphous alloys. / Ünlü, Kenan; Vincent, Dietrich H.

In: Nuclear Inst. and Methods in Physics Research, A, Vol. 299, No. 1-3, 20.12.1990, p. 606-609.

Research output: Contribution to journalArticle

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N2 - The behavior of 3He in the amorphous alloys Ni75.1Cr14P10.1C0.08, Ni63.5Zr36.5 and Ni87.7P12.3 is investigated. The samples were implanted with 150 keV 3He ions with doses of 1 × 1016 and 5 × 1016 3He/cm2. The samples were isochronally annealed at several consecutive stages up to their crystallization temperatures. After each annealing stage, 3He depth profiles were measured by a thermal-neutron-induced nuclear-reaction technique called neutron depth profiling (NDP). The maximum 3He release (∼20%) was observed for the Ni63.5Zr36.5 sample and it occurred before crystallization. Smaller but measurable amounts of 3He were released from most other combinations of sample material and implant doses. The 3He release that we observed is controlled by a detrapping process, and there are indications that it is dependent on the implantation dose. In addition to 3He release measurements, our study yielded a determination of projected depths of 3He ions with an initial energy of 150 keV in the alloys studied. The most probable range values are: 320 ± 21 nm for Ni75.1Cr14P10.1C0.08, 378 ± 34 nm for Ni63.5Zr36.5 and 375 ± 29 nm for Ni87.7P12.3.

AB - The behavior of 3He in the amorphous alloys Ni75.1Cr14P10.1C0.08, Ni63.5Zr36.5 and Ni87.7P12.3 is investigated. The samples were implanted with 150 keV 3He ions with doses of 1 × 1016 and 5 × 1016 3He/cm2. The samples were isochronally annealed at several consecutive stages up to their crystallization temperatures. After each annealing stage, 3He depth profiles were measured by a thermal-neutron-induced nuclear-reaction technique called neutron depth profiling (NDP). The maximum 3He release (∼20%) was observed for the Ni63.5Zr36.5 sample and it occurred before crystallization. Smaller but measurable amounts of 3He were released from most other combinations of sample material and implant doses. The 3He release that we observed is controlled by a detrapping process, and there are indications that it is dependent on the implantation dose. In addition to 3He release measurements, our study yielded a determination of projected depths of 3He ions with an initial energy of 150 keV in the alloys studied. The most probable range values are: 320 ± 21 nm for Ni75.1Cr14P10.1C0.08, 378 ± 34 nm for Ni63.5Zr36.5 and 375 ± 29 nm for Ni87.7P12.3.

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