Real-Time Density Control of a Plasma Source Used for Simulating Low-Earth-Orbit Plasma Environment

Jesse K. McTernan, Omar J. Leon, Sven G. Bilen, John D. Williams, Jason A. Vaughn, Todd A. Schneider, Linda Habash Krause

Research output: Contribution to journalArticle

Abstract

We developed a variable-output-aperture, laboratory plasma source to enable real-time plasma density control with minimal effect on other plasma properties. The source is capable of producing a low-Earth-orbit-type plasma with electron energies of approximately 0.1-0.7 eV and streaming ion energies of approximately 2-4 eV. The plasma density can be adjusted over two orders of magnitude, thus representing some of the natural variability of the ionosphere. In a given aperture range, the electron and ion density decreased by 73% while the average percent difference in electron and ion density was 0.3% with a standard deviation of 1.4%. The average percent difference in ion energy was 6.3% with a standard deviation of 4.3%. The variable aperture was achieved by a rotating dual-grid system.

Original languageEnglish (US)
Article number8734014
Pages (from-to)3891-3897
Number of pages7
JournalIEEE Transactions on Plasma Science
Volume47
Issue number8
DOIs
StatePublished - Aug 1 2019

Fingerprint

low Earth orbits
apertures
plasma density
standard deviation
ionospheres
ions
grids
electron energy
energy
output

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

Cite this

McTernan, J. K., Leon, O. J., Bilen, S. G., Williams, J. D., Vaughn, J. A., Schneider, T. A., & Krause, L. H. (2019). Real-Time Density Control of a Plasma Source Used for Simulating Low-Earth-Orbit Plasma Environment. IEEE Transactions on Plasma Science, 47(8), 3891-3897. [8734014]. https://doi.org/10.1109/TPS.2019.2914659
McTernan, Jesse K. ; Leon, Omar J. ; Bilen, Sven G. ; Williams, John D. ; Vaughn, Jason A. ; Schneider, Todd A. ; Krause, Linda Habash. / Real-Time Density Control of a Plasma Source Used for Simulating Low-Earth-Orbit Plasma Environment. In: IEEE Transactions on Plasma Science. 2019 ; Vol. 47, No. 8. pp. 3891-3897.
@article{8255ef91ef3d45ef9e48bfccc3d47ed7,
title = "Real-Time Density Control of a Plasma Source Used for Simulating Low-Earth-Orbit Plasma Environment",
abstract = "We developed a variable-output-aperture, laboratory plasma source to enable real-time plasma density control with minimal effect on other plasma properties. The source is capable of producing a low-Earth-orbit-type plasma with electron energies of approximately 0.1-0.7 eV and streaming ion energies of approximately 2-4 eV. The plasma density can be adjusted over two orders of magnitude, thus representing some of the natural variability of the ionosphere. In a given aperture range, the electron and ion density decreased by 73{\%} while the average percent difference in electron and ion density was 0.3{\%} with a standard deviation of 1.4{\%}. The average percent difference in ion energy was 6.3{\%} with a standard deviation of 4.3{\%}. The variable aperture was achieved by a rotating dual-grid system.",
author = "McTernan, {Jesse K.} and Leon, {Omar J.} and Bilen, {Sven G.} and Williams, {John D.} and Vaughn, {Jason A.} and Schneider, {Todd A.} and Krause, {Linda Habash}",
year = "2019",
month = "8",
day = "1",
doi = "10.1109/TPS.2019.2914659",
language = "English (US)",
volume = "47",
pages = "3891--3897",
journal = "IEEE Transactions on Plasma Science",
issn = "0093-3813",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "8",

}

McTernan, JK, Leon, OJ, Bilen, SG, Williams, JD, Vaughn, JA, Schneider, TA & Krause, LH 2019, 'Real-Time Density Control of a Plasma Source Used for Simulating Low-Earth-Orbit Plasma Environment', IEEE Transactions on Plasma Science, vol. 47, no. 8, 8734014, pp. 3891-3897. https://doi.org/10.1109/TPS.2019.2914659

Real-Time Density Control of a Plasma Source Used for Simulating Low-Earth-Orbit Plasma Environment. / McTernan, Jesse K.; Leon, Omar J.; Bilen, Sven G.; Williams, John D.; Vaughn, Jason A.; Schneider, Todd A.; Krause, Linda Habash.

In: IEEE Transactions on Plasma Science, Vol. 47, No. 8, 8734014, 01.08.2019, p. 3891-3897.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Real-Time Density Control of a Plasma Source Used for Simulating Low-Earth-Orbit Plasma Environment

AU - McTernan, Jesse K.

AU - Leon, Omar J.

AU - Bilen, Sven G.

AU - Williams, John D.

AU - Vaughn, Jason A.

AU - Schneider, Todd A.

AU - Krause, Linda Habash

PY - 2019/8/1

Y1 - 2019/8/1

N2 - We developed a variable-output-aperture, laboratory plasma source to enable real-time plasma density control with minimal effect on other plasma properties. The source is capable of producing a low-Earth-orbit-type plasma with electron energies of approximately 0.1-0.7 eV and streaming ion energies of approximately 2-4 eV. The plasma density can be adjusted over two orders of magnitude, thus representing some of the natural variability of the ionosphere. In a given aperture range, the electron and ion density decreased by 73% while the average percent difference in electron and ion density was 0.3% with a standard deviation of 1.4%. The average percent difference in ion energy was 6.3% with a standard deviation of 4.3%. The variable aperture was achieved by a rotating dual-grid system.

AB - We developed a variable-output-aperture, laboratory plasma source to enable real-time plasma density control with minimal effect on other plasma properties. The source is capable of producing a low-Earth-orbit-type plasma with electron energies of approximately 0.1-0.7 eV and streaming ion energies of approximately 2-4 eV. The plasma density can be adjusted over two orders of magnitude, thus representing some of the natural variability of the ionosphere. In a given aperture range, the electron and ion density decreased by 73% while the average percent difference in electron and ion density was 0.3% with a standard deviation of 1.4%. The average percent difference in ion energy was 6.3% with a standard deviation of 4.3%. The variable aperture was achieved by a rotating dual-grid system.

UR - http://www.scopus.com/inward/record.url?scp=85070460636&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85070460636&partnerID=8YFLogxK

U2 - 10.1109/TPS.2019.2914659

DO - 10.1109/TPS.2019.2914659

M3 - Article

AN - SCOPUS:85070460636

VL - 47

SP - 3891

EP - 3897

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

SN - 0093-3813

IS - 8

M1 - 8734014

ER -