Recent advances in XPS characterization of ultra-thin oxides

Jeffrey Shallenberger, David A. Cole, Daniel F. Downey, Scott Falk, Zhiyong Zhao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

As ion energies have steadily decreased over the past several years, an ever increasing fraction of the implanted species lies in the outer 10 nm of the sample. Consequently, there is an increased need for characterization tools capable of providing chemical information in this depth range. The unique ability of X-ray photoelectron spectroscopy (XPS, also known as ESCA) to determine quantitatively the local bonding (i.e., oxidation state) in the outer 10 nm of materials makes it a valuable tool for characterizing low energy ion implanted wafers. It has long been known that by measuring the relative amounts of Si° and SiO2, the oxide thickness can be measured on films up to 10 nm thick. Examples will be presented showing oxide thickness measurements precise to ±0.1 nm for ultra-thin (<2 nm) oxides. A similar approach can be used to estimate the concentration of implanted species that are present in the SiO2. Examples will also be given demonstrating the use of XPS in identifying and quantifying organic and inorganic surface carbon species on implanted wafers.

Original languageEnglish (US)
Title of host publicationProceedings of the International Conference on Ion Implantation Technology
PublisherIEEE
Pages566-569
Number of pages4
ISBN (Print)078034538X
StatePublished - Dec 1 1999
EventProceedings of the 1998 International Conference on 'Ion Implantation Technology' Proceedings (IIT'98) - Kyoto, Jpn
Duration: Jun 22 1998Jun 26 1998

Publication series

NameProceedings of the International Conference on Ion Implantation Technology
Volume1

Other

OtherProceedings of the 1998 International Conference on 'Ion Implantation Technology' Proceedings (IIT'98)
CityKyoto, Jpn
Period6/22/986/26/98

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Fingerprint Dive into the research topics of 'Recent advances in XPS characterization of ultra-thin oxides'. Together they form a unique fingerprint.

Cite this