Reduction of adhesion and friction of silicon oxide surface in the presence of n-propanol vapor in the gas phase

K. Strawhecker, D. B. Asay, J. McKinney, S. H. Kim

Research output: Contribution to journalArticle

46 Scopus citations

Abstract

The equilibrium adsorption of gas phase alcohol molecules has been proposed as a new means of in-use anti-stiction and lubrication for MEMS devices. Adhesion and friction of silicon oxide surfaces as a function of n-propanol vapor pressure in the ambient gas were invesitigated using atomic force microscopy. As the vapor pressure increases, the adsorbed n-propanol layer thickness increases. The adhesion and friction significantly decrease with very little addition of n-propanol vapor.

Original languageEnglish (US)
Pages (from-to)17-21
Number of pages5
JournalTribology Letters
Volume19
Issue number1
DOIs
StatePublished - May 1 2005

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Reduction of adhesion and friction of silicon oxide surface in the presence of n-propanol vapor in the gas phase'. Together they form a unique fingerprint.

  • Cite this