Replication molding of ordered sub-micron sized features in poly(urethane urea)

K. R. Milner, M. Balmer, A. J. Snyder, C. A. Siedlecki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A two-stage replication molding method for fabricating ordered submicron sized features over a large area of biomedical poly(urethane urea) (PUU) was investigated. A lithographic technique was used to fabricate a master pattern in a photosensitive resist on a 150 mm diameter silicon wafer. The replication efficiency for each pillar width was calculated as the percentage of the 5×5 pillar array present. The monolayer was shown to reduce replication efficiency and accurate replication was obtained to the resolution limit of 309 nm without it.

Original languageEnglish (US)
Title of host publicationTransactions - 7th World Biomaterials Congress
Number of pages1
StatePublished - Dec 1 2004
EventTransactions - 7th World Biomaterials Congress - Sydney, Australia
Duration: May 17 2004May 21 2004

Publication series

NameTransactions - 7th World Biomaterials Congress

Other

OtherTransactions - 7th World Biomaterials Congress
CountryAustralia
CitySydney
Period5/17/045/21/04

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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  • Cite this

    Milner, K. R., Balmer, M., Snyder, A. J., & Siedlecki, C. A. (2004). Replication molding of ordered sub-micron sized features in poly(urethane urea). In Transactions - 7th World Biomaterials Congress (Transactions - 7th World Biomaterials Congress).