Reversible pattern formation through photolysis

Timothy R. Kline, Ayusman Sen

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

We report a photolytic method to induce spatial and temporal patterning/deposition of particles at the micron scale on a time scale of seconds. Reversible pattern formation by negatively charged particles occur around micron-sized silver features on different substrates when exposed to UV light in the presence of aqueous hydrogen peroxide. Diffusiophoretic motion due to a spatially defined ion gradient accounts for our observations. Atomic force and optical microscopy, as well as conductivity measurements, support this hypothesis.

Original languageEnglish (US)
Pages (from-to)7124-7127
Number of pages4
JournalLangmuir
Volume22
Issue number17
DOIs
StatePublished - Aug 15 2006

Fingerprint

Photolysis
Charged particles
Silver
Hydrogen peroxide
Ultraviolet radiation
Hydrogen Peroxide
Optical microscopy
photolysis
Atomic force microscopy
Ions
Substrates
hydrogen peroxide
charged particles
silver
microscopy
conductivity
gradients
ions

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

Cite this

Kline, Timothy R. ; Sen, Ayusman. / Reversible pattern formation through photolysis. In: Langmuir. 2006 ; Vol. 22, No. 17. pp. 7124-7127.
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Reversible pattern formation through photolysis. / Kline, Timothy R.; Sen, Ayusman.

In: Langmuir, Vol. 22, No. 17, 15.08.2006, p. 7124-7127.

Research output: Contribution to journalArticle

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