Role or UV/chlorine exposure during dry surface conditioning before integrated Epi deposition process

J. Ruzyllo, E. Rohr, M. Caymax, M. Baeyens, T. Conard, P. Mertens, M. Heyns

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Native/chemical oxide etching using the anhydrous HF (AHF)/methano! process before epitaxial deposition was investigated in a cluster incorporating surface processing module and epi deposition reactor. The results of this research indicate that the AHF/methanol process alone leaves the Si surface in a state which does not allow growth of the haze-free epitaxial layer at 800 °C. If the surface is exposed to chlorine ambient following oxide etch, however, haze is eliminated and a high quality epi layer is grown. This effect is attributed primarily to the reduction of fluorine remaining on the surface following AHF/methanol oxide etch by chlorine. The proposed pre-epi surface preparation procedure, which does not involve any elevated temperature step, shows excellent promise for low-temperature fully integrated epitaxial processes.

Original languageEnglish (US)
Title of host publicationUltra Clean Processing of Silicon Surfaces
EditorsMarc Heyns, Marc Meuris, Paul Mertens
PublisherTrans Tech Publications Ltd
Pages233-236
Number of pages4
ISBN (Print)9783908450405
DOIs
StatePublished - Jan 1 1999
Event4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998 - Ostend, Belgium
Duration: Sep 21 1998Sep 23 1998

Publication series

NameSolid State Phenomena
Volume65-66
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Conference

Conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998
CountryBelgium
CityOstend
Period9/21/989/23/98

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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    Ruzyllo, J., Rohr, E., Caymax, M., Baeyens, M., Conard, T., Mertens, P., & Heyns, M. (1999). Role or UV/chlorine exposure during dry surface conditioning before integrated Epi deposition process. In M. Heyns, M. Meuris, & P. Mertens (Eds.), Ultra Clean Processing of Silicon Surfaces (pp. 233-236). (Solid State Phenomena; Vol. 65-66). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.65-66.233