Run-to-run control in semiconductor manufacturing

James Moyne, Enrique Del Castillo, Arnon Max Hurwitz

Research output: Book/ReportBook

141 Citations (Scopus)

Abstract

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine “runs,” thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry’s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Original languageEnglish (US)
PublisherCRC Press
Number of pages348
ISBN (Electronic)9781420040661
ISBN (Print)0849311780, 9780849311789
StatePublished - Jan 1 2000

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Semiconductor materials
Chemical mechanical polishing
Vapor phase epitaxy
Lithography
Process control
Costs

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Moyne, J., Del Castillo, E., & Hurwitz, A. M. (2000). Run-to-run control in semiconductor manufacturing. CRC Press.
Moyne, James ; Del Castillo, Enrique ; Hurwitz, Arnon Max. / Run-to-run control in semiconductor manufacturing. CRC Press, 2000. 348 p.
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Run-to-run control in semiconductor manufacturing. / Moyne, James; Del Castillo, Enrique; Hurwitz, Arnon Max.

CRC Press, 2000. 348 p.

Research output: Book/ReportBook

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Moyne J, Del Castillo E, Hurwitz AM. Run-to-run control in semiconductor manufacturing. CRC Press, 2000. 348 p.