Run-to-run control in semiconductor manufacturing

James Moyne, Enrique Del Castillo, Arnon Max Hurwitz

Research output: Book/ReportBook

150 Scopus citations

Abstract

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine “runs,” thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry’s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Original languageEnglish (US)
PublisherCRC Press
Number of pages348
ISBN (Electronic)9781420040661
ISBN (Print)0849311780, 9780849311789
StatePublished - Jan 1 2000

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Fingerprint Dive into the research topics of 'Run-to-run control in semiconductor manufacturing'. Together they form a unique fingerprint.

Cite this