Run-to-run process control

Literature review and extensions

Enrique Del Castillo, Arnon M. Hurwitz

Research output: Contribution to journalReview article

201 Citations (Scopus)

Abstract

In the last few years, "Run-to-Run" (R2R) control techniques have been developed and used to control various semiconductor manufacturing processes. These techniques combine response surface, statistical process control, and feedback control techniques. This paper provides a literature review of R2R control methods from a statistical and control engineering point of view. It is shown that self-tuning controllers can provide a valuable control strategy for R2R applications. In this paper we address the single-input-single-output (SISO) case. Two proposed self-tuning controllers compensate not only for the standard case of process shifts, but also in the case a deterministic trend and/or autocorrelation is present in the observed response (i.e., in case there exist process dynamics). In order to reduce the input variance, a control chart is added to the output and acts as a deadband.

Original languageEnglish (US)
Pages (from-to)184-196
Number of pages13
JournalJournal of Quality Technology
Volume29
Issue number2
StatePublished - Apr 1 1997

Fingerprint

Literature Review
Process Control
Process control
Self-tuning
Deterministic Trend
Controller
Statistical Process Control
Tuning
Semiconductor Manufacturing
Output
Response Surface
Control Charts
Dynamic Process
Autocorrelation
Controllers
Statistical process control
Feedback Control
Control Strategy
Feedback control
Engineering

All Science Journal Classification (ASJC) codes

  • Safety, Risk, Reliability and Quality
  • Strategy and Management
  • Management Science and Operations Research
  • Industrial and Manufacturing Engineering

Cite this

@article{48374e12c7c34c498819cd4166c9191b,
title = "Run-to-run process control: Literature review and extensions",
abstract = "In the last few years, {"}Run-to-Run{"} (R2R) control techniques have been developed and used to control various semiconductor manufacturing processes. These techniques combine response surface, statistical process control, and feedback control techniques. This paper provides a literature review of R2R control methods from a statistical and control engineering point of view. It is shown that self-tuning controllers can provide a valuable control strategy for R2R applications. In this paper we address the single-input-single-output (SISO) case. Two proposed self-tuning controllers compensate not only for the standard case of process shifts, but also in the case a deterministic trend and/or autocorrelation is present in the observed response (i.e., in case there exist process dynamics). In order to reduce the input variance, a control chart is added to the output and acts as a deadband.",
author = "{Del Castillo}, Enrique and Hurwitz, {Arnon M.}",
year = "1997",
month = "4",
day = "1",
language = "English (US)",
volume = "29",
pages = "184--196",
journal = "Journal of Quality Technology",
issn = "0022-4065",
publisher = "American Society for Quality",
number = "2",

}

Run-to-run process control : Literature review and extensions. / Del Castillo, Enrique; Hurwitz, Arnon M.

In: Journal of Quality Technology, Vol. 29, No. 2, 01.04.1997, p. 184-196.

Research output: Contribution to journalReview article

TY - JOUR

T1 - Run-to-run process control

T2 - Literature review and extensions

AU - Del Castillo, Enrique

AU - Hurwitz, Arnon M.

PY - 1997/4/1

Y1 - 1997/4/1

N2 - In the last few years, "Run-to-Run" (R2R) control techniques have been developed and used to control various semiconductor manufacturing processes. These techniques combine response surface, statistical process control, and feedback control techniques. This paper provides a literature review of R2R control methods from a statistical and control engineering point of view. It is shown that self-tuning controllers can provide a valuable control strategy for R2R applications. In this paper we address the single-input-single-output (SISO) case. Two proposed self-tuning controllers compensate not only for the standard case of process shifts, but also in the case a deterministic trend and/or autocorrelation is present in the observed response (i.e., in case there exist process dynamics). In order to reduce the input variance, a control chart is added to the output and acts as a deadband.

AB - In the last few years, "Run-to-Run" (R2R) control techniques have been developed and used to control various semiconductor manufacturing processes. These techniques combine response surface, statistical process control, and feedback control techniques. This paper provides a literature review of R2R control methods from a statistical and control engineering point of view. It is shown that self-tuning controllers can provide a valuable control strategy for R2R applications. In this paper we address the single-input-single-output (SISO) case. Two proposed self-tuning controllers compensate not only for the standard case of process shifts, but also in the case a deterministic trend and/or autocorrelation is present in the observed response (i.e., in case there exist process dynamics). In order to reduce the input variance, a control chart is added to the output and acts as a deadband.

UR - http://www.scopus.com/inward/record.url?scp=0031124332&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031124332&partnerID=8YFLogxK

M3 - Review article

VL - 29

SP - 184

EP - 196

JO - Journal of Quality Technology

JF - Journal of Quality Technology

SN - 0022-4065

IS - 2

ER -