Run-to-run process control: Literature review and extensions

Enrique Del Castillo, Arnon M. Hurwitz

Research output: Contribution to journalReview article

210 Scopus citations

Abstract

In the last few years, "Run-to-Run" (R2R) control techniques have been developed and used to control various semiconductor manufacturing processes. These techniques combine response surface, statistical process control, and feedback control techniques. This paper provides a literature review of R2R control methods from a statistical and control engineering point of view. It is shown that self-tuning controllers can provide a valuable control strategy for R2R applications. In this paper we address the single-input-single-output (SISO) case. Two proposed self-tuning controllers compensate not only for the standard case of process shifts, but also in the case a deterministic trend and/or autocorrelation is present in the observed response (i.e., in case there exist process dynamics). In order to reduce the input variance, a control chart is added to the output and acts as a deadband.

Original languageEnglish (US)
Pages (from-to)184-196
Number of pages13
JournalJournal of Quality Technology
Volume29
Issue number2
StatePublished - Apr 1 1997

All Science Journal Classification (ASJC) codes

  • Safety, Risk, Reliability and Quality
  • Strategy and Management
  • Management Science and Operations Research
  • Industrial and Manufacturing Engineering

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