Scanning atmospheric plasma processes for surface decontamination and superhydrophobic deposition

Seong Kim, Jeong Hoon Kim, Bang Kwon Kang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

A scanning atmospheric radio-frequency (rf) plasma source was developed for surface decontamination and protective coating deposition. This plasma source was a dielectric barrier discharge system that utilizes a cylindrical electrode and a dielectric barrier surrounding the electrode. The gaseous species present in the plasma were analyzed with in-situ spectroscopic technique. Since the plasma generation region was open to ambient air, nitrogen, oxygen and water molecules in the air were readily excited. This system was used for decontamination of organophosphorus nerve agents and deposition of hydrophobic and superhydrophobic coatings on various substrates including ceramics, metals, fabrics, and nanofibers.

Original languageEnglish (US)
Title of host publicationNanoscience and Nanotechnology for Chemical and Biological Defense
PublisherAmerican Chemical Society
Pages323-336
Number of pages14
ISBN (Print)9780841269811
DOIs
StatePublished - Dec 11 2009

Publication series

NameACS Symposium Series
Volume1016
ISSN (Print)0097-6156
ISSN (Electronic)1947-5918

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)

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    Kim, S., Kim, J. H., & Kang, B. K. (2009). Scanning atmospheric plasma processes for surface decontamination and superhydrophobic deposition. In Nanoscience and Nanotechnology for Chemical and Biological Defense (pp. 323-336). (ACS Symposium Series; Vol. 1016). American Chemical Society. https://doi.org/10.1021/bk-2009-1016.ch024