Schottky Barrier Height Quantification of Plasma Treated P(VDF-TRFE) Thin Films

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Angle-resolved XPS and ToF-SIMS are employed to determine the impact of O 2 /CF 4 plasma treatment on P(VDF-TrFE) surface chemistry. Results indicate that chemical modification by plasma increases the percentage of F and O at the film surface, with the grafted species remaining within the first 5-10nm of the film. Analysis of current-voltage I(V) data reveals that high field conduction is an interfacially dominated phenomenon in the modified P(VDF-TrFE) thin films. A parametric study of Schottky emission theory indicates that conduction is dominated by change in Schottky barrier height relative to change in both material permittivity and Richardson constant. Schottky barrier height quantification estimates a lowering of the barrier height by 0.041eV due to plasma treatment, further supporting that conduction is surface dominated in thin P(VDF -TrFE) films, and that conduction can be significantly influenced via surface chemical modification.

Original languageEnglish (US)
Title of host publication2018 IEEE CEIDP Conference on Electrical Insulation and Dielectric Phenomena, CEIDP 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages9-13
Number of pages5
ISBN (Electronic)9781538661925
DOIs
StatePublished - Nov 26 2018
Event2018 IEEE CEIDP Conference on Electrical Insulation and Dielectric Phenomena, CEIDP 2018 - Cancun, Mexico
Duration: Oct 21 2018Oct 24 2018

Publication series

NameAnnual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP
Volume2018-October
ISSN (Print)0084-9162

Other

Other2018 IEEE CEIDP Conference on Electrical Insulation and Dielectric Phenomena, CEIDP 2018
CountryMexico
CityCancun
Period10/21/1810/24/18

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Vecchio, M., Barhoumi Ep Meddeb, A., Ounaies, Z., Lanagan, M. T., & Shallenberger, J. (2018). Schottky Barrier Height Quantification of Plasma Treated P(VDF-TRFE) Thin Films. In 2018 IEEE CEIDP Conference on Electrical Insulation and Dielectric Phenomena, CEIDP 2018 (pp. 9-13). [8544868] (Annual Report - Conference on Electrical Insulation and Dielectric Phenomena, CEIDP; Vol. 2018-October). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/CEIDP.2018.8544868