Seeding of silicon wire growth by out-diffused metal precipitates

Vidya Ganapati, David P. Fenning, Mariana I. Bertoni, Chito E. Kendrick, Alexandria E. Fecych, Joan M. Redwing, Tonio Buonassisi

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Metals diffused into bulk silicon can be manipulated to out-diffuse and precipitate in microsized droplets at surfaces, allowing for subsequent silicon wire growth. This technique allows for both high-throughput and precision in the size and positions of metal droplets on the silicon surface.

Original languageEnglish (US)
Pages (from-to)563-567
Number of pages5
JournalSmall
Volume7
Issue number5
DOIs
StatePublished - Mar 7 2011

All Science Journal Classification (ASJC) codes

  • Biotechnology
  • Biomaterials
  • Chemistry(all)
  • Materials Science(all)

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