Self-aligned electrodes on SU-8 negative photoresist pedestals

H. Raymond Fok, Thomas N. Jackson

Research output: Contribution to journalArticle

Abstract

We report a novel technique by which self-aligned thin-film electrodes are fabricated on SU-8 negative photoresist pedestals. A bilayer aluminum and titanium structure is used to align the thin-film electrode and to serve as the optical mask for the UV exposure of the SU-8. The SU-8 developer is used to remove both the unexposed SU-8 and the bilayer structure of aluminum and titanium. The result is a thin-film electrode aligned on an SU-8 pedestal with a minimal undercut beneath the thin-film electrode.

Original languageEnglish (US)
Article number6784311
Pages (from-to)508-510
Number of pages3
JournalJournal of Microelectromechanical Systems
Volume23
Issue number3
DOIs
StatePublished - Jun 2014

Fingerprint

Photoresists
Thin films
Electrodes
Titanium
Aluminum
Masks

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

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Self-aligned electrodes on SU-8 negative photoresist pedestals. / Fok, H. Raymond; Jackson, Thomas N.

In: Journal of Microelectromechanical Systems, Vol. 23, No. 3, 6784311, 06.2014, p. 508-510.

Research output: Contribution to journalArticle

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