Semiconductor surface cleaning and conditioning challenges beyond planar silicon technology

Jerzy Ruzyllo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

The paper reviews the challenges semiconductor cleaning technology is facing in the light of: (i) advanced silicon technology moving in the direction of non-planar device structures such as 3D MOS gates, MEMS devices as well ID nanowire-type structures, (ii) the need for modified cleans for semiconductors other than silicon, e.g. Ge and III-V compounds, and (iii) emerging needs to process surfaces of non-semiconductor substrates such as for instance sapphire in SOS (Silicon-On-Sapphire) material systems. It is concluded that in several areas significant modifications of the established cleaning technology are needed to meet emerging challenges.

Original languageEnglish (US)
Title of host publicationECS Transactions - 22nd Symposium on Microelectronics Technology and Devices, SBMicro2007
Pages87-95
Number of pages9
Edition1
DOIs
StatePublished - Dec 1 2007
Event22nd Symposium on Microelectronics Technology and Devices, SBMicro2007 - Rio de Janeiro, Brazil
Duration: Sep 3 2007Sep 6 2007

Publication series

NameECS Transactions
Number1
Volume9
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other22nd Symposium on Microelectronics Technology and Devices, SBMicro2007
CountryBrazil
CityRio de Janeiro
Period9/3/079/6/07

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All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Ruzyllo, J. (2007). Semiconductor surface cleaning and conditioning challenges beyond planar silicon technology. In ECS Transactions - 22nd Symposium on Microelectronics Technology and Devices, SBMicro2007 (1 ed., pp. 87-95). (ECS Transactions; Vol. 9, No. 1). https://doi.org/10.1149/1.2766877