Silicon Schottky-Barrier Modification by IonImplantation Damage

S. Ashok, A. Mogro-Campero

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Abstract

Low-energy (5-keV) high-dose (1015 cm–2) argon implantation has been carried out on n- and p-type silicon to confirm the role of ion damage on the characteristics of subsequently formed Schottky barrier diodes. The electrical behavior of the diodes is similar to that observed recently on inert-gas ion-etched and reactive-ion-etched silicon surfaces, thus unambiguously attributing the Schottky-barrier modification to ion-induced surface damage.

Original languageEnglish (US)
Pages (from-to)48-49
Number of pages2
JournalIEEE Electron Device Letters
Volume5
Issue number2
DOIs
StatePublished - Feb 1984

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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