Site-specific functionalization on individual colloids: Size control, stability, and multilayers

Allison M. Yake, Charles E. Snyder, Darrell Velegol

Research output: Contribution to journalArticlepeer-review

65 Scopus citations

Abstract

Individual colloidal particles are locally functionalized with nanoscale control. Here we use the particle lithography technique to mask one region of a silica or polystyrene particle (size 3.0 μm down to 170 nm), while the remaining 95% or more of the particle is coated with various sized nanocolloids. The images and data show precise and predictable control over the size of the region, with fine-tuned patch size control obtainable by changing the ionic strength of the solution. The coating on the particles remains stable even when subjected to sonication for 5 min. Both single regions and multilayer annuluses are readily formed. Particle lithography provides a general, reliable, stable, controllable, and scalable method for placing site-specific functionalizations on individual particles, opening the way to more complex particle patterning and the bottom-up assembly of more complex structures.

Original languageEnglish (US)
Pages (from-to)9069-9075
Number of pages7
JournalLangmuir
Volume23
Issue number17
DOIs
StatePublished - Aug 14 2007

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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