Spatial light modulator for maskless optical projection lithography

G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. BowerJ. S. Weiner, Y. L. Low

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

Spatial light modulators (SLMs) designed to replace photomasks for optical lithography have been designed, fabricated, and tested. These microelectromechanical devices are fabricated with alternating polycrystalline Si and sacrificial Si O2 layers that are patterned by a 193 nm wavelength scanner to dimensions as small as 150 nm. Aerial image simulations were used to define the mechanical requirements of the devices. Piston motion of electrically actuated devices was measured with an optical profilometer. The measurements were fit to a simple equation to within 1 nm precision, which is adequate for defining 50 nm features lithographically. Transient response measurements show that one version of the SLM responds to actuation as quickly as 20 μs, fast enough for current 193 nm wavelength excimer laser sources.

Original languageEnglish (US)
Pages (from-to)2852-2856
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume24
Issue number6
DOIs
StatePublished - 2006

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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