Spectroscopic measurements of the surface stoichiometry of chemical vapor deposited GaN

H. S. Craft, A. L. Rice, R. Collazo, Z. Sitar, J. P. Maria

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

We report on the surface stoichiometry of Ga-polar GaN films grown by metalorganic chemical vapor deposition as studied by x-ray photoelectron spectroscopy. GaN film surfaces are found to be Ga-rich, with Ga:N ratios ranging from 1.3:1 to 3.2:1. In vacuo ion-beam sputter/annealing studies show that these treatments drive the apparent Ga:N surface composition farther from unity, either through a decrease in surface contamination, oxidation of the surface, or both. Simple annealing experiments decrease the Ga:N ratio. The measured GaN ratio is correlated with the GaN growth time, suggesting that residual Ga precursor after growth interacts with the GaN surface as it cools.

Original languageEnglish (US)
Article number082110
JournalApplied Physics Letters
Volume98
Issue number8
DOIs
StatePublished - Feb 21 2011

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Spectroscopic measurements of the surface stoichiometry of chemical vapor deposited GaN'. Together they form a unique fingerprint.

Cite this