TY - JOUR
T1 - Sputtering of molybdenum and tungsten nano rods and nodules irradiated with 150 eV argon ions
AU - Ghoniem, N. M.
AU - Sehirlioglu, Alp
AU - Neff, Anton L.
AU - Allain, Jean Paul
AU - Williams, Brian
AU - Sharghi-Moshtaghin, Reza
N1 - Funding Information:
This material is based upon work supported by the US Air Force Office of Scientific Research (AFOSR), under award number FA9550-11-1-0282.
PY - 2015/3/15
Y1 - 2015/3/15
N2 - Abstract The influence of surface nano architecture on the sputtering and erosion of tungsten and molybdenum is discussed. We present an experimental investigation of the effects of low energy (150 eV) Ar ions on surface sputtering in Mo and W nano-rods and nano-nodules at room temperature. Measurements of the sputtering rate from Mo and W surfaces with nano architecture indicate that the surface topology plays an important role in the mechanism of surface erosion and restructuring. Chemical vapor deposition (CVD) is utilized as a material processing route to fabricate nano-architectures on the surfaces of W and Mo substrates. First, Re dendrites form as needles with cross-sections that have hexagonal symmetry, and are subsequently employed as scaffolding for further deposition of W and Mo to create nano rod surface architecture. The sputtering of surface atoms in these samples shows a marked dependence on their surface architecture. The sputtering rate is shown to decrease at normal ion incidence in all nano-architecture surfaces as compared to planar surfaces. Moreover, and unlike an increase in sputtering of planar crystalline surfaces, the current measurements show a decrease in the net sputtering rate at oblique angles as compared to normal incidence. Energy deposition in the near surface layer shows that W is also amorphized at room temperature by low energy Ar ions to a depth of 5-10 nm.
AB - Abstract The influence of surface nano architecture on the sputtering and erosion of tungsten and molybdenum is discussed. We present an experimental investigation of the effects of low energy (150 eV) Ar ions on surface sputtering in Mo and W nano-rods and nano-nodules at room temperature. Measurements of the sputtering rate from Mo and W surfaces with nano architecture indicate that the surface topology plays an important role in the mechanism of surface erosion and restructuring. Chemical vapor deposition (CVD) is utilized as a material processing route to fabricate nano-architectures on the surfaces of W and Mo substrates. First, Re dendrites form as needles with cross-sections that have hexagonal symmetry, and are subsequently employed as scaffolding for further deposition of W and Mo to create nano rod surface architecture. The sputtering of surface atoms in these samples shows a marked dependence on their surface architecture. The sputtering rate is shown to decrease at normal ion incidence in all nano-architecture surfaces as compared to planar surfaces. Moreover, and unlike an increase in sputtering of planar crystalline surfaces, the current measurements show a decrease in the net sputtering rate at oblique angles as compared to normal incidence. Energy deposition in the near surface layer shows that W is also amorphized at room temperature by low energy Ar ions to a depth of 5-10 nm.
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U2 - 10.1016/j.apsusc.2014.12.201
DO - 10.1016/j.apsusc.2014.12.201
M3 - Article
AN - SCOPUS:84924692135
VL - 331
SP - 299
EP - 308
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
M1 - 29470
ER -