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Stability of fluorinated parylenes to oxygen reactive-ion etching under aluminum, aluminum oxide, and tantalum nitride overlayers
Jay J. Senkevich, B. Wang, J. B. Fortin, M. C. Nielsen, J. F. McDonald, T. M. Lu, G. M. Nuesca, G. G. Peterson, S. C. Selbrede, M. T. Weise
Research output: Contribution to journal › Article › peer-review
3
Scopus
citations