Stability of fluorinated parylenes to oxygen reactive-ion etching under aluminum, aluminum oxide, and tantalum nitride overlayers

Jay J. Senkevich, B. Wang, J. B. Fortin, M. C. Nielsen, J. F. McDonald, T. M. Lu, G. M. Nuesca, G. G. Peterson, S. C. Selbrede, M. T. Weise

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