Step-and-grow approach for precisely positioned nanowire array structure fabrication

W. J. Nam, P. Park, S. Joshi, H. Carrion, P. Garg, S. J. Fonash

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A novel fabrication approach for forming precisely positioned nanowire array structures is introduced. The approach is suitable for potentially economical and environmentally safe manufacturing. For the demonstration of this approach, 100nm wide Sn nanowires and 150nm wide polyaniline (PANI) nanowires were synthesized using an electro-chemical deposition technique and a process we term the step-and-grow method. The nanowires produced exhibit the expected properties. For example, synthesized PANI nanowires showed reasonable ranges of electrical conductivities (e.g., 25S/cm for a 200nm wide, 200nm high, 10um long nanowire), and formed ohmic contact with electrodes on a substrate. It is shown that the polydimethylsiloxane (PDMS) stepping template mold used for our step-and-grow nanowire synthesis process can be used at least up to 40 times without degradation.

Original languageEnglish (US)
Title of host publicationAmerican Society of Mechanical Engineers
Pages653-657
Number of pages5
DOIs
StatePublished - Dec 28 2007
Event2007 ASME International Conference on Manufacturing Science and Engineering - Atlanta, GA, United States
Duration: Jan 15 2007Oct 18 2007

Publication series

NameProceedings of the ASME International Manufacturing Science and Engineering Conference 2007, MSEC2007

Other

Other2007 ASME International Conference on Manufacturing Science and Engineering
CountryUnited States
CityAtlanta, GA
Period1/15/0710/18/07

All Science Journal Classification (ASJC) codes

  • Industrial and Manufacturing Engineering

Fingerprint Dive into the research topics of 'Step-and-grow approach for precisely positioned nanowire array structure fabrication'. Together they form a unique fingerprint.

Cite this