Step-flow growth of perovskite PbTiO3 thin films epitaxially grown on a miscut SrTiO3 substrate

Kiyotaka Wasa, Yoko Haneda, Toshifumi Sato, Hideaki Adachi, Isaku Kanno, Darrell G. Schlom, Susan E. Trolier-McKinstry, Qing Gang, Chang-Beom

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6 Scopus citations


Continuous single crystal (001)PbTiO3 thin films under a step-flow growth mode were epitaxially grown on the miscut (001)SrTiO3 substrate with miscut angle of 1.7°. A planar magnetron sputtering system was used for the epitaxial growth. The film thickness was ranged from 5 to 250 nm. The surface of the sputtered PbTiO3 thin films comprised periodic striped patterns with step lines and atomically flat terraces. The typical step height and terrace width were 3 nm and 200 nm, respectively. The partial oxygen pressure during sputtering deposition affected the stability of the step-flow growth mode. Lower partial oxygen pressure stabilized the step-flow growth mode resulting in a layer growth. The PT thin films include the stress due to the tetragonal lattice deformation.

Original languageEnglish (US)
Pages (from-to)182-189
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1998

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Condensed Matter Physics


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