Studies of parylene C microfibrous thin films electrical properties

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

We have fabricated and measured the room-temperature capacitance in metal-insulator-metal (MIM) structures utilizing the Parylene C films as the insulators in the frequency range 1 kHz to 1 MHz. The Parylene-C films were of variable thicknesses and were either spin-on dense films or columnar microfibrous thin films (μFTFs) grown using oblique angle physicochemical vapor deposition. The values of the vapor tilt angle, Xv, used were 30°, 60°, or 90°. Expectedly, columnar microfibrous thin film of Parylene C is observed to have lower values of k than the dense one. However, it is observed that the dielectric constant of the ìFTFs is increased with increasing deposition tilt angle Xv. This is explained in terms of film porosity as a function of Xv, which is enhanced in films deposited at lower tilt angles. The dependence of k on measurement frequency suggests that molecular dipole effects dominate charge polarization in the films.

Original languageEnglish (US)
Title of host publicationSemiconductors, Dielectrics, and Metals for Nanoelectronics 14
EditorsK. Kita, S. Kar, D. Landheer, D. Misra
PublisherElectrochemical Society Inc.
Pages235-243
Number of pages9
Edition5
ISBN (Electronic)9781607685395
DOIs
StatePublished - Jan 1 2016
EventSymposium on Semiconductors, Dielectrics, and Metals for Nanoelectronics 14 - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: Oct 2 2016Oct 7 2016

Publication series

NameECS Transactions
Number5
Volume75
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherSymposium on Semiconductors, Dielectrics, and Metals for Nanoelectronics 14 - PRiME 2016/230th ECS Meeting
CountryUnited States
CityHonolulu
Period10/2/1610/7/16

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Khawaji, I. H., Awadelkarim, O. O., & Lakhtakia, A. (2016). Studies of parylene C microfibrous thin films electrical properties. In K. Kita, S. Kar, D. Landheer, & D. Misra (Eds.), Semiconductors, Dielectrics, and Metals for Nanoelectronics 14 (5 ed., pp. 235-243). (ECS Transactions; Vol. 75, No. 5). Electrochemical Society Inc.. https://doi.org/10.1149/07505.0235ecst