Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization

Jean Paul Allain, Osman El-Atwani, Alex Cimaroli, Daniel L. Rokusek, Sami Ortoleva, Anastassiya Suslova

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Ion-beam sputtering (IBS) has been studied as a means for scalable, mask-less nanopatterning of surfaces. Patterning at the nanoscale has been achieved for numerous types of materials including: semiconductors, metals and insulators. Although much work has been focused on tailoring nanopatterning by systematic ion-beam parameter manipulation, limited work has addressed elucidating on the underlying mechanisms for self-organization of multi-component surfaces. In particular there has been little attention to correlate the surface chemistry variation during ion irradiation with the evolution of surface morphology and nanoscale self-organization. Moreover the role of surface impurities on patterning is not well known and characterization during the time-scale of modification remains challenging. This work summarizes an in-situ approach to characterize the evolution of surface chemistry during irradiation and its correlation to surface nanopatterning for a variety of multi-components surfaces. The work highlights the importance and role of surface impurities in nanopatterning of a surface during low-energy ion irradiation. In particular, it shows the importance of irradiation-driven mechanisms in GaSb(100) nanopatterning by low-energy ions and how the study of these systems can be impacted by oxide formation.

Original languageEnglish (US)
Title of host publicationIon Beams - New Applications from Mesoscale to Nanoscale
Pages127-133
Number of pages7
DOIs
StatePublished - Dec 1 2012
Event2011 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 25 2011Apr 29 2011

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1354
ISSN (Print)0272-9172

Conference

Conference2011 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period4/25/114/29/11

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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    Allain, J. P., El-Atwani, O., Cimaroli, A., Rokusek, D. L., Ortoleva, S., & Suslova, A. (2012). Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization. In Ion Beams - New Applications from Mesoscale to Nanoscale (pp. 127-133). (Materials Research Society Symposium Proceedings; Vol. 1354). https://doi.org/10.1557/opl.2011.1458