TY - GEN
T1 - Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization
AU - Allain, Jean Paul
AU - El-Atwani, Osman
AU - Cimaroli, Alex
AU - Rokusek, Daniel L.
AU - Ortoleva, Sami
AU - Suslova, Anastassiya
N1 - Funding Information:
We would like to thank Brandon Holybee for AFM results. This work is supported in part by the Department of Energy’s 2010 Early Career Award DE-SC0004032 and the NRC (NRC-38-08-948) Faculty Development grant. We also would like to acknowledge helpful discussions with Stefan Facsko, Michael Aziz and Mark Bradley.
PY - 2012
Y1 - 2012
N2 - Ion-beam sputtering (IBS) has been studied as a means for scalable, mask-less nanopatterning of surfaces. Patterning at the nanoscale has been achieved for numerous types of materials including: semiconductors, metals and insulators. Although much work has been focused on tailoring nanopatterning by systematic ion-beam parameter manipulation, limited work has addressed elucidating on the underlying mechanisms for self-organization of multi-component surfaces. In particular there has been little attention to correlate the surface chemistry variation during ion irradiation with the evolution of surface morphology and nanoscale self-organization. Moreover the role of surface impurities on patterning is not well known and characterization during the time-scale of modification remains challenging. This work summarizes an in-situ approach to characterize the evolution of surface chemistry during irradiation and its correlation to surface nanopatterning for a variety of multi-components surfaces. The work highlights the importance and role of surface impurities in nanopatterning of a surface during low-energy ion irradiation. In particular, it shows the importance of irradiation-driven mechanisms in GaSb(100) nanopatterning by low-energy ions and how the study of these systems can be impacted by oxide formation.
AB - Ion-beam sputtering (IBS) has been studied as a means for scalable, mask-less nanopatterning of surfaces. Patterning at the nanoscale has been achieved for numerous types of materials including: semiconductors, metals and insulators. Although much work has been focused on tailoring nanopatterning by systematic ion-beam parameter manipulation, limited work has addressed elucidating on the underlying mechanisms for self-organization of multi-component surfaces. In particular there has been little attention to correlate the surface chemistry variation during ion irradiation with the evolution of surface morphology and nanoscale self-organization. Moreover the role of surface impurities on patterning is not well known and characterization during the time-scale of modification remains challenging. This work summarizes an in-situ approach to characterize the evolution of surface chemistry during irradiation and its correlation to surface nanopatterning for a variety of multi-components surfaces. The work highlights the importance and role of surface impurities in nanopatterning of a surface during low-energy ion irradiation. In particular, it shows the importance of irradiation-driven mechanisms in GaSb(100) nanopatterning by low-energy ions and how the study of these systems can be impacted by oxide formation.
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U2 - 10.1557/opl.2011.1458
DO - 10.1557/opl.2011.1458
M3 - Conference contribution
AN - SCOPUS:84875429886
SN - 9781605113319
T3 - Materials Research Society Symposium Proceedings
SP - 127
EP - 133
BT - Ion Beams - New Applications from Mesoscale to Nanoscale
T2 - 2011 MRS Spring Meeting
Y2 - 25 April 2011 through 29 April 2011
ER -