Sub-150 nm, high-aspect-ratio features using near-field phase-shifting contact lithography

Hai Dang, Jackie Lim Piu Tan, Mark W. Horn

Research output: Contribution to journalArticlepeer-review

10 Scopus citations
Original languageEnglish (US)
Pages (from-to)1143-1148
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number3
DOIs
StatePublished - 2003

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Sub-150 nm, high-aspect-ratio features using near-field phase-shifting contact lithography'. Together they form a unique fingerprint.

Cite this