Sub- 30-nm patterning on quartz for imprint lithography templates

Charan Srinivasan, J. Nathan Hohman, Mary E. Anderson, Paul S. Weiss, Mark W. Horn

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub- 30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.

Original languageEnglish (US)
Article number083123
JournalApplied Physics Letters
Volume93
Issue number8
DOIs
StatePublished - 2008

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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