Substrate screening of the interaction between adsorbed atoms and molecules: Ne, Ar, Kr, Xe, and CH4 on graphite

Susanna Rauber, James R. Klein, Milton W. Cole

Research output: Contribution to journalArticlepeer-review

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Abstract

This paper treats the electrodynamic screening by the substrate of the van der Waals interaction between adsorbed particles. The free-space interaction is modified by a perturbation V, which describes the effect of the substrate. The McLachlan expression for V is evaluated for the cases of Ne, Ar, Kr, Xe, and CH4 adsorbed on graphite basal planes, and a potential energy between adsorbed molecules (atoms) is calculated. The main effect is a reduction in well depth of 15-20% from the free-space values. Experimental data are semiquantitatively consistent with these potentials. Discussion of the results and their implications is given.

Original languageEnglish (US)
Pages (from-to)1314-1320
Number of pages7
JournalPhysical Review B
Volume27
Issue number2
DOIs
StatePublished - Jan 1 1983

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

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